JPS6474725A - Etching device - Google Patents
Etching deviceInfo
- Publication number
- JPS6474725A JPS6474725A JP23301687A JP23301687A JPS6474725A JP S6474725 A JPS6474725 A JP S6474725A JP 23301687 A JP23301687 A JP 23301687A JP 23301687 A JP23301687 A JP 23301687A JP S6474725 A JPS6474725 A JP S6474725A
- Authority
- JP
- Japan
- Prior art keywords
- plate electrodes
- parallel
- magnets
- generated
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To improve the uniformity of etching inside a substrate by so constituting as to have two plate electrodes arranged in parallel and two magnets arranged in parallel to the plate electrodes and on their both sides so that a magnetic field may be generated in the vertical direction to an electric field generated when high frequency electric power is impressed between the plate electrodes by the magnets. CONSTITUTION:A magnetic field having uniform distribution between the parallel plate electrodes is generated by two magnets 7A arranged in parallel to the plate electrodes 2, 3 and on their both sides. Owing thereto, plasma having equal density generated between the parallel plate electrodes so as to obtain uniform etching speed inside a substrate. Further, when electromagnets are used for the magnets 7A and are made to rotate about a central axis vertical to the parallel plate electrodes as shown by an arrow, the etching uniformity is more improved. Furthermore, even solely a magnet coil will do for an electromagnet or such having a magnetic core will also suffice for it, only requiring to obtain a uniform magnetic field between the parallel plate electrodes. Thereby, the uniformity of etching inside the substrate can be improved in RIE.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23301687A JPS6474725A (en) | 1987-09-17 | 1987-09-17 | Etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23301687A JPS6474725A (en) | 1987-09-17 | 1987-09-17 | Etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6474725A true JPS6474725A (en) | 1989-03-20 |
Family
ID=16948490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23301687A Pending JPS6474725A (en) | 1987-09-17 | 1987-09-17 | Etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6474725A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01191016A (en) * | 1988-01-26 | 1989-08-01 | Sankei Seisakusho:Kk | Displacement detector |
KR100387522B1 (en) * | 2001-06-23 | 2003-06-18 | 김형준 | Apparatuses and methods for heat treatment of semiconductor films upon thermally susceptible non-conducting substrates |
-
1987
- 1987-09-17 JP JP23301687A patent/JPS6474725A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01191016A (en) * | 1988-01-26 | 1989-08-01 | Sankei Seisakusho:Kk | Displacement detector |
KR100387522B1 (en) * | 2001-06-23 | 2003-06-18 | 김형준 | Apparatuses and methods for heat treatment of semiconductor films upon thermally susceptible non-conducting substrates |
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