JPS6474725A - Etching device - Google Patents

Etching device

Info

Publication number
JPS6474725A
JPS6474725A JP23301687A JP23301687A JPS6474725A JP S6474725 A JPS6474725 A JP S6474725A JP 23301687 A JP23301687 A JP 23301687A JP 23301687 A JP23301687 A JP 23301687A JP S6474725 A JPS6474725 A JP S6474725A
Authority
JP
Japan
Prior art keywords
plate electrodes
parallel
magnets
generated
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23301687A
Other languages
Japanese (ja)
Inventor
Satoshi Mihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP23301687A priority Critical patent/JPS6474725A/en
Publication of JPS6474725A publication Critical patent/JPS6474725A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To improve the uniformity of etching inside a substrate by so constituting as to have two plate electrodes arranged in parallel and two magnets arranged in parallel to the plate electrodes and on their both sides so that a magnetic field may be generated in the vertical direction to an electric field generated when high frequency electric power is impressed between the plate electrodes by the magnets. CONSTITUTION:A magnetic field having uniform distribution between the parallel plate electrodes is generated by two magnets 7A arranged in parallel to the plate electrodes 2, 3 and on their both sides. Owing thereto, plasma having equal density generated between the parallel plate electrodes so as to obtain uniform etching speed inside a substrate. Further, when electromagnets are used for the magnets 7A and are made to rotate about a central axis vertical to the parallel plate electrodes as shown by an arrow, the etching uniformity is more improved. Furthermore, even solely a magnet coil will do for an electromagnet or such having a magnetic core will also suffice for it, only requiring to obtain a uniform magnetic field between the parallel plate electrodes. Thereby, the uniformity of etching inside the substrate can be improved in RIE.
JP23301687A 1987-09-17 1987-09-17 Etching device Pending JPS6474725A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23301687A JPS6474725A (en) 1987-09-17 1987-09-17 Etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23301687A JPS6474725A (en) 1987-09-17 1987-09-17 Etching device

Publications (1)

Publication Number Publication Date
JPS6474725A true JPS6474725A (en) 1989-03-20

Family

ID=16948490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23301687A Pending JPS6474725A (en) 1987-09-17 1987-09-17 Etching device

Country Status (1)

Country Link
JP (1) JPS6474725A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191016A (en) * 1988-01-26 1989-08-01 Sankei Seisakusho:Kk Displacement detector
KR100387522B1 (en) * 2001-06-23 2003-06-18 김형준 Apparatuses and methods for heat treatment of semiconductor films upon thermally susceptible non-conducting substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01191016A (en) * 1988-01-26 1989-08-01 Sankei Seisakusho:Kk Displacement detector
KR100387522B1 (en) * 2001-06-23 2003-06-18 김형준 Apparatuses and methods for heat treatment of semiconductor films upon thermally susceptible non-conducting substrates

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