JPS5741374A - Sample mounting and dismounting device in plasma etching device or resembling device - Google Patents
Sample mounting and dismounting device in plasma etching device or resembling deviceInfo
- Publication number
- JPS5741374A JPS5741374A JP11599780A JP11599780A JPS5741374A JP S5741374 A JPS5741374 A JP S5741374A JP 11599780 A JP11599780 A JP 11599780A JP 11599780 A JP11599780 A JP 11599780A JP S5741374 A JPS5741374 A JP S5741374A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- chamber
- etching
- dismounting
- arm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To mount and dismount samples in a short time by providing a sample conveying arm between an etching chamber and a spare chamber for exchanging samples, making it rotatable 180° and performing mounting and dismounting of the sample simultaneously in a plasma etching device.
CONSTITUTION: A conveying arm 8 is provided between an etching chamber 1 in which a reaction tube 6a provided with a microwave generator 6 projects and a spare chamber 2 for sample exchanging adjacent thereto, and support members 9 containing a sample 18 to be etched are mounted to both ends thereof. A gate valve 3 is provided between the etching chamber 1 and the spare chamber 2 to provide such width at which the arm 8 can pass freely when the valve is opened. The arm 8 receiving the sample 18 from a load cassette 15a in the chamber 2 rotates 180°, and places the sample on the sample rotary table 4 in the chamber 1 by the supporting member 9 on the opposite side. The sample is plasma etched under the reaction tube 6a. The mounting and dismounting operations of the sample can be 1/2 that in the prior art and the etching operation is carried out in a short time.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11599780A JPS5741374A (en) | 1980-08-25 | 1980-08-25 | Sample mounting and dismounting device in plasma etching device or resembling device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11599780A JPS5741374A (en) | 1980-08-25 | 1980-08-25 | Sample mounting and dismounting device in plasma etching device or resembling device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5741374A true JPS5741374A (en) | 1982-03-08 |
Family
ID=14676288
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11599780A Pending JPS5741374A (en) | 1980-08-25 | 1980-08-25 | Sample mounting and dismounting device in plasma etching device or resembling device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5741374A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61195048U (en) * | 1985-05-24 | 1986-12-04 | ||
JPS62149891A (en) * | 1985-12-24 | 1987-07-03 | Tokuda Seisakusho Ltd | Dry etching device |
US4876724A (en) * | 1988-04-29 | 1989-10-24 | Toshiba America, Inc. | Personal sound system |
JPH10223606A (en) * | 1997-01-31 | 1998-08-21 | Shibaura Eng Works Co Ltd | Resist ashing apparatus |
-
1980
- 1980-08-25 JP JP11599780A patent/JPS5741374A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61195048U (en) * | 1985-05-24 | 1986-12-04 | ||
JPH058674Y2 (en) * | 1985-05-24 | 1993-03-04 | ||
JPS62149891A (en) * | 1985-12-24 | 1987-07-03 | Tokuda Seisakusho Ltd | Dry etching device |
JPS6366911B2 (en) * | 1985-12-24 | 1988-12-22 | Tokuda Seisakusho | |
US4876724A (en) * | 1988-04-29 | 1989-10-24 | Toshiba America, Inc. | Personal sound system |
JPH10223606A (en) * | 1997-01-31 | 1998-08-21 | Shibaura Eng Works Co Ltd | Resist ashing apparatus |
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