JPS5391667A - Plasma cvd device - Google Patents

Plasma cvd device

Info

Publication number
JPS5391667A
JPS5391667A JP593377A JP593377A JPS5391667A JP S5391667 A JPS5391667 A JP S5391667A JP 593377 A JP593377 A JP 593377A JP 593377 A JP593377 A JP 593377A JP S5391667 A JPS5391667 A JP S5391667A
Authority
JP
Japan
Prior art keywords
plasma cvd
cvd device
electrodes
plasma
enclose
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP593377A
Other languages
Japanese (ja)
Inventor
Tatsu Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP593377A priority Critical patent/JPS5391667A/en
Publication of JPS5391667A publication Critical patent/JPS5391667A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enclose the plasma between the opposing electrodes and to prevent the processed surface from being damaged, by providing a pair of electrodes having a number of holes for excited particle passage as one electrode, and by reacting with plasma for the reaction gas between those electrodes.
COPYRIGHT: (C)1978,JPO&Japio
JP593377A 1977-01-24 1977-01-24 Plasma cvd device Pending JPS5391667A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP593377A JPS5391667A (en) 1977-01-24 1977-01-24 Plasma cvd device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP593377A JPS5391667A (en) 1977-01-24 1977-01-24 Plasma cvd device

Publications (1)

Publication Number Publication Date
JPS5391667A true JPS5391667A (en) 1978-08-11

Family

ID=11624687

Family Applications (1)

Application Number Title Priority Date Filing Date
JP593377A Pending JPS5391667A (en) 1977-01-24 1977-01-24 Plasma cvd device

Country Status (1)

Country Link
JP (1) JPS5391667A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8336488B2 (en) 2007-11-30 2012-12-25 Advanced Micro-Fabrication Equipment, Inc. Asia Multi-station plasma reactor with multiple plasma regions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8336488B2 (en) 2007-11-30 2012-12-25 Advanced Micro-Fabrication Equipment, Inc. Asia Multi-station plasma reactor with multiple plasma regions

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