JPS5391667A - Plasma cvd device - Google Patents
Plasma cvd deviceInfo
- Publication number
- JPS5391667A JPS5391667A JP593377A JP593377A JPS5391667A JP S5391667 A JPS5391667 A JP S5391667A JP 593377 A JP593377 A JP 593377A JP 593377 A JP593377 A JP 593377A JP S5391667 A JPS5391667 A JP S5391667A
- Authority
- JP
- Japan
- Prior art keywords
- plasma cvd
- cvd device
- electrodes
- plasma
- enclose
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To enclose the plasma between the opposing electrodes and to prevent the processed surface from being damaged, by providing a pair of electrodes having a number of holes for excited particle passage as one electrode, and by reacting with plasma for the reaction gas between those electrodes.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP593377A JPS5391667A (en) | 1977-01-24 | 1977-01-24 | Plasma cvd device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP593377A JPS5391667A (en) | 1977-01-24 | 1977-01-24 | Plasma cvd device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5391667A true JPS5391667A (en) | 1978-08-11 |
Family
ID=11624687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP593377A Pending JPS5391667A (en) | 1977-01-24 | 1977-01-24 | Plasma cvd device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5391667A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8336488B2 (en) | 2007-11-30 | 2012-12-25 | Advanced Micro-Fabrication Equipment, Inc. Asia | Multi-station plasma reactor with multiple plasma regions |
-
1977
- 1977-01-24 JP JP593377A patent/JPS5391667A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8336488B2 (en) | 2007-11-30 | 2012-12-25 | Advanced Micro-Fabrication Equipment, Inc. Asia | Multi-station plasma reactor with multiple plasma regions |
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