JPS5734360A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5734360A JPS5734360A JP11001680A JP11001680A JPS5734360A JP S5734360 A JPS5734360 A JP S5734360A JP 11001680 A JP11001680 A JP 11001680A JP 11001680 A JP11001680 A JP 11001680A JP S5734360 A JPS5734360 A JP S5734360A
- Authority
- JP
- Japan
- Prior art keywords
- region
- regions
- collector
- base
- high density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
Abstract
PURPOSE:To obtain a power transistor device with a protective diode formed in one body by a method wherein reverse conductive region is provided at a section on the collector region of a junction transistor and a high density region is formed in between the reverse conductive region and a base region. CONSTITUTION:A P-region 5 is provided within the area whereon a collector depletion layer will be formed on the front side of the collector region 2 of a device 10, a high density region 6 is formed between the P region and a base 3 and a structure, wherein the regions 2 and 5 are short-circuited with an electrode 9, is obtained. The density ratio of the regions 2 and 6 is established in such manner that the withstand voltage between the regions 3 and 5, which will be determined in proportion to the distance between the regions 3 and 5, will be made smaller than that between the regions 3 and 6, and the regions 2 and 3 respectively. Through these procedures, a circuit wherein a Zener diode is connected in paralled between the base and collector, can be installed in the device 10, thereby enabling to cut down the cost, miniaturize and increase the reliability of the semiconductor device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11001680A JPS5734360A (en) | 1980-08-11 | 1980-08-11 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11001680A JPS5734360A (en) | 1980-08-11 | 1980-08-11 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5734360A true JPS5734360A (en) | 1982-02-24 |
JPS6348190B2 JPS6348190B2 (en) | 1988-09-28 |
Family
ID=14524978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11001680A Granted JPS5734360A (en) | 1980-08-11 | 1980-08-11 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5734360A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4727408A (en) * | 1984-06-11 | 1988-02-23 | Nec Corporation | Semiconductor device with high breakdown voltage vertical transistor and fabricating method therefor |
JPH02303035A (en) * | 1989-05-17 | 1990-12-17 | Toshiba Corp | Semiconductor device |
JPH04170072A (en) * | 1990-11-02 | 1992-06-17 | Nec Corp | Semiconductor device |
DE102019203395A1 (en) | 2018-03-20 | 2019-09-26 | Fanuc Corporation | Arm structure of a robot as well as robot |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5415988A (en) * | 1974-12-11 | 1979-02-06 | Saint Gobain | Parts using between multiilayer window glass |
-
1980
- 1980-08-11 JP JP11001680A patent/JPS5734360A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5415988A (en) * | 1974-12-11 | 1979-02-06 | Saint Gobain | Parts using between multiilayer window glass |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4727408A (en) * | 1984-06-11 | 1988-02-23 | Nec Corporation | Semiconductor device with high breakdown voltage vertical transistor and fabricating method therefor |
JPH02303035A (en) * | 1989-05-17 | 1990-12-17 | Toshiba Corp | Semiconductor device |
JPH04170072A (en) * | 1990-11-02 | 1992-06-17 | Nec Corp | Semiconductor device |
JP2689719B2 (en) * | 1990-11-02 | 1997-12-10 | 日本電気株式会社 | Semiconductor device |
DE102019203395A1 (en) | 2018-03-20 | 2019-09-26 | Fanuc Corporation | Arm structure of a robot as well as robot |
Also Published As
Publication number | Publication date |
---|---|
JPS6348190B2 (en) | 1988-09-28 |
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