JPS5732657A - Method of rpoducing glass ceramic substrate - Google Patents

Method of rpoducing glass ceramic substrate

Info

Publication number
JPS5732657A
JPS5732657A JP8589881A JP8589881A JPS5732657A JP S5732657 A JPS5732657 A JP S5732657A JP 8589881 A JP8589881 A JP 8589881A JP 8589881 A JP8589881 A JP 8589881A JP S5732657 A JPS5732657 A JP S5732657A
Authority
JP
Japan
Prior art keywords
rpoducing
ceramic substrate
glass ceramic
glass
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8589881A
Other languages
English (en)
Other versions
JPS643355B2 (ja
Inventor
Jiei Deyubetsutsukii Derii
Uin Haron Resutaa
Nabinchiyandora Masutaa Raji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5732657A publication Critical patent/JPS5732657A/ja
Publication of JPS643355B2 publication Critical patent/JPS643355B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4867—Applying pastes or inks, e.g. screen printing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Glass Compositions (AREA)
JP8589881A 1980-07-14 1981-06-05 Method of rpoducing glass ceramic substrate Granted JPS5732657A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/167,975 US4340436A (en) 1980-07-14 1980-07-14 Process for flattening glass-ceramic substrates

Publications (2)

Publication Number Publication Date
JPS5732657A true JPS5732657A (en) 1982-02-22
JPS643355B2 JPS643355B2 (ja) 1989-01-20

Family

ID=22609575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8589881A Granted JPS5732657A (en) 1980-07-14 1981-06-05 Method of rpoducing glass ceramic substrate

Country Status (4)

Country Link
US (1) US4340436A (ja)
EP (1) EP0043955B1 (ja)
JP (1) JPS5732657A (ja)
DE (1) DE3161547D1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60137884A (ja) * 1983-12-26 1985-07-22 株式会社日立製作所 セラミツク多層配線回路基板の製造法
JPS60257195A (ja) * 1984-06-01 1985-12-18 鳴海製陶株式会社 ハイブリツド基板及びその製造方法

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118077A (en) * 1981-01-06 1982-07-22 Central Glass Co Ltd Manufacture of glazed ceramic substrate
DE3204167A1 (de) * 1982-02-06 1983-08-11 Brown, Boveri & Cie Ag, 6800 Mannheim Verfahren zum direkten verbinden von metallstuecken mit oxidkeramiksubstraten
JPS59995A (ja) * 1982-06-16 1984-01-06 富士通株式会社 銅導体多層構造体の製造方法
US4540621A (en) * 1983-07-29 1985-09-10 Eggerding Carl L Dielectric substrates comprising cordierite and method of forming the same
JPS60254697A (ja) * 1984-05-31 1985-12-16 富士通株式会社 多層セラミック回路基板および製法
DE3534886A1 (de) * 1984-09-30 1986-04-03 Kabushiki Kaisha Toshiba, Kawasaki, Kanagawa Verfahren zum herstellen von aluminiumnitrid-keramik-platten
US4645552A (en) * 1984-11-19 1987-02-24 Hughes Aircraft Company Process for fabricating dimensionally stable interconnect boards
JPS61155243A (ja) * 1984-12-28 1986-07-14 富士通株式会社 グリ−ンシ−ト組成物
US4738885A (en) * 1986-02-24 1988-04-19 Kyocera Corporation Magnetic disk, substrate therefor and process for preparation thereof
US4898842A (en) * 1986-03-03 1990-02-06 International Business Machines Corporation Organometallic-derived cordierite and other compounds comprising oxides of silicon
US4753694A (en) * 1986-05-02 1988-06-28 International Business Machines Corporation Process for forming multilayered ceramic substrate having solid metal conductors
US5130067A (en) * 1986-05-02 1992-07-14 International Business Machines Corporation Method and means for co-sintering ceramic/metal mlc substrates
US4808365A (en) * 1986-10-24 1989-02-28 International Business Machines Corporation Method for reducing edge curl on green sheets
FR2626270B1 (fr) * 1988-01-22 1992-04-30 Pechiney Recherche Procede de cofrittage, de conducteurs en cuivre ou en alliages a base de cuivre et de leur substrat ceramique en cordierite
US5194196A (en) * 1989-10-06 1993-03-16 International Business Machines Corporation Hermetic package for an electronic device and method of manufacturing same
US5211786A (en) * 1990-12-21 1993-05-18 W. R. Grace & Co.-Conn. Use of permeable materials to improve hot pressing process
US5316989A (en) * 1991-05-08 1994-05-31 Gilbert James Method for making a smooth-surface ceramic
DE69314211T2 (de) * 1992-03-25 1998-04-16 Nissan Chemical Ind Ltd Darstellung eines Sinterkörpers aus Zirconiumoxid
JP2559977B2 (ja) * 1992-07-29 1996-12-04 インターナショナル・ビジネス・マシーンズ・コーポレイション バイアに係るクラックを除去する方法及び構造、並びに、半導体セラミックパッケージ基板。
US5519191A (en) * 1992-10-30 1996-05-21 Corning Incorporated Fluid heater utilizing laminar heating element having conductive layer bonded to flexible ceramic foil substrate
US5350637A (en) * 1992-10-30 1994-09-27 Corning Incorporated Microlaminated composites and method
US5798469A (en) * 1992-12-29 1998-08-25 International Business Machines Corporation Non-sintering controlled pattern formation
US5655209A (en) * 1995-03-28 1997-08-05 International Business Machines Corporation Multilayer ceramic substrates having internal capacitor, and process for producing same
US5755570A (en) * 1995-05-26 1998-05-26 International Business Machines Corporation Apparatus for in situ environment sensitive sealing and/or product controlling
US5628849A (en) * 1995-05-26 1997-05-13 International Business Machines Corporation Method for in-situ environment sensitive sealing and/or product controlling
US6042667A (en) * 1996-03-13 2000-03-28 Sumotomo Metal Electronics Devices, Inc. Method of fabricating ceramic multilayer substrate
US5874162A (en) * 1996-10-10 1999-02-23 International Business Machines Corporation Weighted sintering process and conformable load tile
JP4334139B2 (ja) * 1997-12-23 2009-09-30 インフィコン ゲゼルシャフト ミット ベシュレンクテル ハフツング 容量式の真空測定セルのためのダイヤフラム
CN1182378C (zh) * 1997-12-23 2004-12-29 尤纳克西斯巴尔策斯有限公司 电容式真空度测量元件及其制造方法
US6194053B1 (en) * 1998-02-26 2001-02-27 International Business Machines Corporation Apparatus and method fabricating buried and flat metal features
US6285080B1 (en) 1998-11-23 2001-09-04 International Business Machines Corporation Planar metallized substrate with embedded camber control material and method thereof
US6395337B1 (en) 1999-07-30 2002-05-28 International Business Machines Corporation Substrate with ceramic coating for camber modification and method for making
DE60220687T2 (de) 2001-10-01 2007-12-27 Heraeus, Inc. Ungesintertes niedertemperaturglaskeramikband für elektronische mikrobauteile, verfahren zur herstellung und verwendung
DE10205877A1 (de) * 2002-02-13 2003-09-04 Epcos Ag Keramisches Vielschichtbauelement, Verfahren zu dessen Herstellung und Haltevorrichtung
US20090186195A1 (en) * 2006-09-08 2009-07-23 Reactive Nanotechnologies, Inc. Reactive Multilayer Joining With Improved Metallization Techniques
ES2408861T3 (es) * 2010-07-07 2013-06-21 Technical University Of Denmark Método para sinterización
US9206086B2 (en) 2012-04-18 2015-12-08 Nitto Denko Corporation Method and apparatus for sintering flat ceramics
US9205571B2 (en) 2012-04-18 2015-12-08 Nitto Denko Corporation Method and apparatus for sintering flat ceramics
US9362546B1 (en) 2013-01-07 2016-06-07 Quantumscape Corporation Thin film lithium conducting powder material deposition from flux
DE102013007703A1 (de) * 2013-05-03 2014-11-06 Forschungszentrum Jülich GmbH Verfahren zur Herstellung einer Glaslot-Gründichtung
WO2015054320A2 (en) 2013-10-07 2015-04-16 Quantumscape Corporation Garnet materials for li secondary batteries and methods of making and using garnet materials
EP3283450A4 (en) 2015-04-16 2018-10-17 QuantumScape Corporation Setter plates for solid electrolyte fabrication and methods of using the same to prepare dense solid electrolytes
US9966630B2 (en) 2016-01-27 2018-05-08 Quantumscape Corporation Annealed garnet electrolyte separators
WO2018027200A1 (en) 2016-08-05 2018-02-08 Quantumscape Corporation Translucent and transparent separators
WO2018075809A1 (en) 2016-10-21 2018-04-26 Quantumscape Corporation Lithium-stuffed garnet electrolytes with a reduced surface defect density and methods of making and using the same
US11489193B2 (en) 2017-06-23 2022-11-01 Quantumscape Battery, Inc. Lithium-stuffed garnet electrolytes with secondary phase inclusions
US10347937B2 (en) 2017-06-23 2019-07-09 Quantumscape Corporation Lithium-stuffed garnet electrolytes with secondary phase inclusions
WO2019090360A1 (en) 2017-11-06 2019-05-09 Quantumscape Corporation Lithium-stuffed garnet thin films and pellets having an oxyfluorinated and/or fluorinated surface and methods of making and using the thin films and pellets
CN112437759A (zh) * 2018-07-16 2021-03-02 康宁股份有限公司 具有改善的翘曲的玻璃制品的陶瓷化方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1671028B1 (de) * 1966-05-18 1971-07-15 Siemens Ag Verfahren zur herstellung von brennunterlagen oder auflagen fuer die verwendung bei der sinterung von duennen plaett chenfoermigen rohlingen aus oxidkeramischen werkstoffen
US3968193A (en) * 1971-08-27 1976-07-06 International Business Machines Corporation Firing process for forming a multilayer glass-metal module
US3879509A (en) * 1971-09-07 1975-04-22 Gilbert James Elderbaum Method of producing thin ceramic sheets with minimal distortion
US4301324A (en) * 1978-02-06 1981-11-17 International Business Machines Corporation Glass-ceramic structures and sintered multilayer substrates thereof with circuit patterns of gold, silver or copper
US4234367A (en) * 1979-03-23 1980-11-18 International Business Machines Corporation Method of making multilayered glass-ceramic structures having an internal distribution of copper-based conductors

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60137884A (ja) * 1983-12-26 1985-07-22 株式会社日立製作所 セラミツク多層配線回路基板の製造法
JPH0470124B2 (ja) * 1983-12-26 1992-11-10 Hitachi Ltd
JPS60257195A (ja) * 1984-06-01 1985-12-18 鳴海製陶株式会社 ハイブリツド基板及びその製造方法
JPH0213955B2 (ja) * 1984-06-01 1990-04-05 Narumi China Corp

Also Published As

Publication number Publication date
DE3161547D1 (en) 1984-01-05
JPS643355B2 (ja) 1989-01-20
US4340436A (en) 1982-07-20
EP0043955B1 (en) 1983-11-30
EP0043955A1 (en) 1982-01-20

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