JPS572523A - Pattern forming apparatus - Google Patents
Pattern forming apparatusInfo
- Publication number
- JPS572523A JPS572523A JP7662180A JP7662180A JPS572523A JP S572523 A JPS572523 A JP S572523A JP 7662180 A JP7662180 A JP 7662180A JP 7662180 A JP7662180 A JP 7662180A JP S572523 A JPS572523 A JP S572523A
- Authority
- JP
- Japan
- Prior art keywords
- light
- lens
- cells
- small cells
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 abstract 2
- 230000001427 coherent effect Effects 0.000 abstract 1
- 230000008602 contraction Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To accurately form a desired pattern with a transmitted light by forming an arbitrary shape with a liquid crystal panel made of a plurality of small cells and emitting a light thereto. CONSTITUTION:A light from a light source 1 become a coherent light via a lens 2, which is incided vertically to a liquid crystal panel 3 made of small cells, is transmitted through only the cells, to which a voltage is applied, the light thus passed through the cells is condensed as an image on the resist of a chrominum plate on a stage 6 through a lens 4, and a mask pattern is thus formed. When the voltage is thus applied to the small cells to become a desired shape and the contraction factor of the lens 4 is increased, a desired mask pattern can be arbitrarily and accurately formed in a short time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7662180A JPS572523A (en) | 1980-06-09 | 1980-06-09 | Pattern forming apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7662180A JPS572523A (en) | 1980-06-09 | 1980-06-09 | Pattern forming apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS572523A true JPS572523A (en) | 1982-01-07 |
Family
ID=13610413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7662180A Pending JPS572523A (en) | 1980-06-09 | 1980-06-09 | Pattern forming apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS572523A (en) |
-
1980
- 1980-06-09 JP JP7662180A patent/JPS572523A/en active Pending
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