JPS572523A - Pattern forming apparatus - Google Patents

Pattern forming apparatus

Info

Publication number
JPS572523A
JPS572523A JP7662180A JP7662180A JPS572523A JP S572523 A JPS572523 A JP S572523A JP 7662180 A JP7662180 A JP 7662180A JP 7662180 A JP7662180 A JP 7662180A JP S572523 A JPS572523 A JP S572523A
Authority
JP
Japan
Prior art keywords
light
lens
cells
small cells
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7662180A
Other languages
Japanese (ja)
Inventor
Yukihiro Oketa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Hitachi Ome Electronic Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd, Hitachi Ome Electronic Co Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP7662180A priority Critical patent/JPS572523A/en
Publication of JPS572523A publication Critical patent/JPS572523A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To accurately form a desired pattern with a transmitted light by forming an arbitrary shape with a liquid crystal panel made of a plurality of small cells and emitting a light thereto. CONSTITUTION:A light from a light source 1 become a coherent light via a lens 2, which is incided vertically to a liquid crystal panel 3 made of small cells, is transmitted through only the cells, to which a voltage is applied, the light thus passed through the cells is condensed as an image on the resist of a chrominum plate on a stage 6 through a lens 4, and a mask pattern is thus formed. When the voltage is thus applied to the small cells to become a desired shape and the contraction factor of the lens 4 is increased, a desired mask pattern can be arbitrarily and accurately formed in a short time.
JP7662180A 1980-06-09 1980-06-09 Pattern forming apparatus Pending JPS572523A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7662180A JPS572523A (en) 1980-06-09 1980-06-09 Pattern forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7662180A JPS572523A (en) 1980-06-09 1980-06-09 Pattern forming apparatus

Publications (1)

Publication Number Publication Date
JPS572523A true JPS572523A (en) 1982-01-07

Family

ID=13610413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7662180A Pending JPS572523A (en) 1980-06-09 1980-06-09 Pattern forming apparatus

Country Status (1)

Country Link
JP (1) JPS572523A (en)

Similar Documents

Publication Publication Date Title
DE3468913D1 (en) Deflection member and method of manufacture thereof
JPS572523A (en) Pattern forming apparatus
JPS57106128A (en) Forming method for pattern
JPS53110543A (en) Optical branching and coupling circuit
JPS533841A (en) Manufacture of image input element
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS5330330A (en) Developing liquid for radiant ray resist
JPS5388728A (en) Method of forming pattern
JPS5352390A (en) Anti-reflective transparent materialand its production
JPS53147531A (en) Forming method for thin film pattern
JPS5742043A (en) Photosensitive material
JPS54110857A (en) Optical production of sawtooth photo-sensitive resin flim
JPS5555528A (en) Mask aligner
JPS5741637A (en) Microstep tablet
JPS52115694A (en) Display element
JPS53141035A (en) Photoetching method
JPS5356000A (en) Reflective type liquid crystal display unit
JPS52134345A (en) Micro fische research unit
JPS57106034A (en) Patterning method
JPS5464979A (en) Forming method for test-use colored transparent drawing
JPS547941A (en) Production of optical diffusive plate
JPS5635137A (en) Photomask
JPS53143242A (en) Production of optical diffusing plate
JPS52142680A (en) Evaporation apparatus
JPS5219098A (en) Photo-resist applying method for liquid cell use base-plate