JPS57207345A - Light irradiation annealing device - Google Patents
Light irradiation annealing deviceInfo
- Publication number
- JPS57207345A JPS57207345A JP9245181A JP9245181A JPS57207345A JP S57207345 A JPS57207345 A JP S57207345A JP 9245181 A JP9245181 A JP 9245181A JP 9245181 A JP9245181 A JP 9245181A JP S57207345 A JPS57207345 A JP S57207345A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chamber
- lamp
- heater
- approx
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000137 annealing Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 5
- 238000010438 heat treatment Methods 0.000 abstract 3
- 230000002411 adverse Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
- H01L21/2686—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation using incoherent radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Recrystallisation Techniques (AREA)
- Furnace Details (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9245181A JPS57207345A (en) | 1981-06-16 | 1981-06-16 | Light irradiation annealing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9245181A JPS57207345A (en) | 1981-06-16 | 1981-06-16 | Light irradiation annealing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57207345A true JPS57207345A (en) | 1982-12-20 |
JPS6341212B2 JPS6341212B2 (ja) | 1988-08-16 |
Family
ID=14054760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9245181A Granted JPS57207345A (en) | 1981-06-16 | 1981-06-16 | Light irradiation annealing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57207345A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0345443A2 (de) * | 1988-05-09 | 1989-12-13 | Siemens Aktiengesellschaft | Verfahren zum Kurzzeittempern einer Halbleiterscheibe durch Bestrahlung |
JP2002141298A (ja) * | 2000-11-02 | 2002-05-17 | Toshiba Corp | 半導体装置の製造方法 |
JP2007274007A (ja) * | 2007-06-18 | 2007-10-18 | Toshiba Corp | 半導体装置の製造方法 |
-
1981
- 1981-06-16 JP JP9245181A patent/JPS57207345A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0345443A2 (de) * | 1988-05-09 | 1989-12-13 | Siemens Aktiengesellschaft | Verfahren zum Kurzzeittempern einer Halbleiterscheibe durch Bestrahlung |
JP2002141298A (ja) * | 2000-11-02 | 2002-05-17 | Toshiba Corp | 半導体装置の製造方法 |
JP2007274007A (ja) * | 2007-06-18 | 2007-10-18 | Toshiba Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6341212B2 (ja) | 1988-08-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS56100412A (en) | Manufacture of semiconductor device | |
DE3471154D1 (en) | A reflector structure for infrared radiation ovens | |
GB2015317A (en) | Apparatus for curing tobacco | |
JPS5581378A (en) | Heat roller fixing device | |
JPS57207345A (en) | Light irradiation annealing device | |
JPS5780729A (en) | Annealing device for semiconductor | |
JPS6474717A (en) | Formation of thin film | |
JPS5648128A (en) | Heating treatment | |
FR2442405A1 (fr) | Four combine a chauffage par hyperfrequences et par convection | |
GB2086565B (en) | Gas fired radiant heater with integrated electric heating elements | |
JPS568173A (en) | Fixing device | |
SU125669A1 (ru) | Способ быстрого нагрева до высоких температур длиномерных изделий или образцов при движении или в покое | |
JPS5235710A (en) | In-material-heat reflection plate device in heating furnaces | |
JPS5998518A (ja) | ランプ・アニ−ル装置 | |
JPS5396541A (en) | High-frequency heater | |
JPS5748762A (en) | Contact heat roll type fixation device | |
JPS5277486A (en) | Heating method for exhaust of fluorescent light | |
JPS54125260A (en) | Film heating device | |
JPS5677631A (en) | High-frequency heating apparatus | |
JPS56167167A (en) | Flash fixing device | |
JPS5790552A (en) | Solar heat collecting apparatus | |
JPS57187629A (en) | Cooker by heating | |
JPS5212879A (en) | Electron-cooled type device for detecing rays of radiant light | |
JPS5517465A (en) | Measuring method of high temperature performance of semiconductor device | |
JPS645014A (en) | Manufacturing equipment for semiconductor |