JPS5720468A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5720468A
JPS5720468A JP9434880A JP9434880A JPS5720468A JP S5720468 A JPS5720468 A JP S5720468A JP 9434880 A JP9434880 A JP 9434880A JP 9434880 A JP9434880 A JP 9434880A JP S5720468 A JPS5720468 A JP S5720468A
Authority
JP
Japan
Prior art keywords
base
emitter
sio2
layer
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9434880A
Other languages
Japanese (ja)
Other versions
JPH0130307B2 (en
Inventor
Hajime Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP9434880A priority Critical patent/JPS5720468A/en
Publication of JPS5720468A publication Critical patent/JPS5720468A/en
Publication of JPH0130307B2 publication Critical patent/JPH0130307B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE:To prevent drop of gain in the high frequency range by attaching a base electrode to a base electrode drawing layer brought into contact with the side of a base layer. CONSTITUTION:An Si3N4 21 is applied on a collector substrate 20 as a mask and it undergoes a wet oxidation to make SiO2 22. After the removal 21, impurities are introduced thereinto to form a base 25 and an emitter 26. The SiO2 22 is etched by a given depth to expose each side of the layers 26 and 25 while the base-collector junction is left covered with the layer 22. It is covered with a conductivity type poly Si 27 identical to the base and the poly Si is removed from the surface of the emitter 26 and the side of base-emitter junction with a mask applied so that it is left only connected to the side of the base 25. A base connection layer 29 is provided by doping at a low temperature and then, a coat of SiO2 is applied and an opening is etched therethrough to provide electrodes 31 and 32 along with an electrode 33 attached to the substrate 20. With such an arrangement, the ratio of cercumferential length of the emitter to the area of the collector can be maximized with limited area of the emitter thereby preventing drop of the gain in the high frequency range.
JP9434880A 1980-07-10 1980-07-10 Semiconductor device Granted JPS5720468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9434880A JPS5720468A (en) 1980-07-10 1980-07-10 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9434880A JPS5720468A (en) 1980-07-10 1980-07-10 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS5720468A true JPS5720468A (en) 1982-02-02
JPH0130307B2 JPH0130307B2 (en) 1989-06-19

Family

ID=14107773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9434880A Granted JPS5720468A (en) 1980-07-10 1980-07-10 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5720468A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594165A (en) * 1982-06-30 1984-01-10 Fujitsu Ltd Semiconductor device
JPS62112279U (en) * 1985-12-28 1987-07-17

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5141317A (en) * 1974-09-19 1976-04-07 Canon Kk Jukiginen no seizoho
JPS52103971A (en) * 1976-02-26 1977-08-31 Nec Corp Semiconductor device
JPS5328384A (en) * 1976-08-27 1978-03-16 Fujitsu Ltd Production method of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5141317A (en) * 1974-09-19 1976-04-07 Canon Kk Jukiginen no seizoho
JPS52103971A (en) * 1976-02-26 1977-08-31 Nec Corp Semiconductor device
JPS5328384A (en) * 1976-08-27 1978-03-16 Fujitsu Ltd Production method of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594165A (en) * 1982-06-30 1984-01-10 Fujitsu Ltd Semiconductor device
JPS62112279U (en) * 1985-12-28 1987-07-17

Also Published As

Publication number Publication date
JPH0130307B2 (en) 1989-06-19

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