JPS57204118A - Forming device for amorphous thin-film - Google Patents

Forming device for amorphous thin-film

Info

Publication number
JPS57204118A
JPS57204118A JP9010781A JP9010781A JPS57204118A JP S57204118 A JPS57204118 A JP S57204118A JP 9010781 A JP9010781 A JP 9010781A JP 9010781 A JP9010781 A JP 9010781A JP S57204118 A JPS57204118 A JP S57204118A
Authority
JP
Japan
Prior art keywords
film
reaction chamber
amorphous thin
forming device
pressure gage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9010781A
Other languages
Japanese (ja)
Inventor
Mari Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9010781A priority Critical patent/JPS57204118A/en
Publication of JPS57204118A publication Critical patent/JPS57204118A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Abstract

PURPOSE:To homogenize and stabilize the amorphous film by mounting an exhaust regulating valve between the reaction chamber and exhauster of the amorphous thin-film forming device and automatically controlling the valve on the basis of the signals of a pressure gage. CONSTITUTION:The amorphous thin-film forming device is formed by the reaction chamber 1 housing plate electrodes 10, a vacuum exhaust pump 6 and a bumb 3 as a gas supply source while the pressure gage 7 is set up to the reaction chamber 1, the exhaust conductance regulating valve 5 is mounted between the reaction chamber 1 and the vacuum exhaust pump 6, and the amorphous thin-film is formed while the valve 5 is controlled by an automatic control system 8 on the basis of the detecting signals of the pressure gage 7. Accordingly, plasma in the reaction chamber can be stabilized, and the amorphous thin- film can be homogenized and stabilized.
JP9010781A 1981-06-09 1981-06-09 Forming device for amorphous thin-film Pending JPS57204118A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9010781A JPS57204118A (en) 1981-06-09 1981-06-09 Forming device for amorphous thin-film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9010781A JPS57204118A (en) 1981-06-09 1981-06-09 Forming device for amorphous thin-film

Publications (1)

Publication Number Publication Date
JPS57204118A true JPS57204118A (en) 1982-12-14

Family

ID=13989288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9010781A Pending JPS57204118A (en) 1981-06-09 1981-06-09 Forming device for amorphous thin-film

Country Status (1)

Country Link
JP (1) JPS57204118A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5669991B1 (en) * 2014-03-31 2015-02-18 Ｓｐｐテクノロジーズ株式会社 Plasma processing equipment
JP5687397B1 (en) * 2014-03-31 2015-03-18 Ｓｐｐテクノロジーズ株式会社 Plasma processing apparatus and opening / closing mechanism used therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5669991B1 (en) * 2014-03-31 2015-02-18 Ｓｐｐテクノロジーズ株式会社 Plasma processing equipment
JP5687397B1 (en) * 2014-03-31 2015-03-18 Ｓｐｐテクノロジーズ株式会社 Plasma processing apparatus and opening / closing mechanism used therefor
WO2015151149A1 (en) * 2014-03-31 2015-10-08 Ｓｐｐテクノロジーズ株式会社 Plasma processing device and opening/closing mechanism used therein
WO2015151147A1 (en) * 2014-03-31 2015-10-08 Ｓｐｐテクノロジーズ株式会社 Plasma processing device
JPWO2015151570A1 (en) * 2014-03-31 2017-04-13 Ｓｐｐテクノロジーズ株式会社 Plasma processing equipment

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