JPS57203787A - Gold-indium alloy plating method - Google Patents

Gold-indium alloy plating method

Info

Publication number
JPS57203787A
JPS57203787A JP8860581A JP8860581A JPS57203787A JP S57203787 A JPS57203787 A JP S57203787A JP 8860581 A JP8860581 A JP 8860581A JP 8860581 A JP8860581 A JP 8860581A JP S57203787 A JPS57203787 A JP S57203787A
Authority
JP
Japan
Prior art keywords
acid
gold
indium
plating
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8860581A
Other languages
Japanese (ja)
Other versions
JPH0123557B2 (en
Inventor
Toshiyuki Akaza
Tsutomu Suzuki
Masaharu Kawanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ARAKAWA KAKO KK
ARAKAWA KAKOU KK
Original Assignee
ARAKAWA KAKO KK
ARAKAWA KAKOU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ARAKAWA KAKO KK, ARAKAWA KAKOU KK filed Critical ARAKAWA KAKO KK
Priority to JP8860581A priority Critical patent/JPS57203787A/en
Publication of JPS57203787A publication Critical patent/JPS57203787A/en
Publication of JPH0123557B2 publication Critical patent/JPH0123557B2/ja
Granted legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE: To obtain a thick plating layer which has perfect specular surface gloss, high hardness, excellent abrasion resistance, adhesive property and corrosion resistance, by adding trivalent gold containing cyanogen, to a plating liquid of low pH containing indium salt, and performing electric plating.
CONSTITUTION: Trivalent gold containing cyanogen is added by 1W30g/l to a plating liquid whose pH is ≤3.0, containing 10W400g/l of acidic oxide of acetic acid, citric acid, tartaric acid, phosphoric acid, lactic acid, etc., and 0.1W50g/l as metallic indium in the form of soluble salt in an acidic oxide solution based on salt of sulfuric acid, sulphamic acid, citric acid, tartaric acid, phosphoric acid, etc., also an interfacial active agent such as polyethylene glycol, etc. is contained as necessary, electric plating is performed at a bath temperature of 20W70°C and by current density of 0.1W5A/dm2, and a thick plating layer of gold-indium is obtained.
COPYRIGHT: (C)1982,JPO&Japio
JP8860581A 1981-06-09 1981-06-09 Gold-indium alloy plating method Granted JPS57203787A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8860581A JPS57203787A (en) 1981-06-09 1981-06-09 Gold-indium alloy plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8860581A JPS57203787A (en) 1981-06-09 1981-06-09 Gold-indium alloy plating method

Publications (2)

Publication Number Publication Date
JPS57203787A true JPS57203787A (en) 1982-12-14
JPH0123557B2 JPH0123557B2 (en) 1989-05-02

Family

ID=13947442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8860581A Granted JPS57203787A (en) 1981-06-09 1981-06-09 Gold-indium alloy plating method

Country Status (1)

Country Link
JP (1) JPS57203787A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009287118A (en) * 2008-04-22 2009-12-10 Rohm & Haas Electronic Materials Llc Method of replenishing indium ions in indium electroplating composition
KR20160085790A (en) 2013-11-08 2016-07-18 니신 쇼쿠힌 홀딩스 가부시키가이샤 Noodle cutting machine and raw noodles

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009287118A (en) * 2008-04-22 2009-12-10 Rohm & Haas Electronic Materials Llc Method of replenishing indium ions in indium electroplating composition
US8491773B2 (en) 2008-04-22 2013-07-23 Rohm And Haas Electronic Materials Llc Method of replenishing indium ions in indium electroplating compositions
KR20160085790A (en) 2013-11-08 2016-07-18 니신 쇼쿠힌 홀딩스 가부시키가이샤 Noodle cutting machine and raw noodles

Also Published As

Publication number Publication date
JPH0123557B2 (en) 1989-05-02

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