JPS57200559A - Apparatus and method for forming optical thin film - Google Patents
Apparatus and method for forming optical thin filmInfo
- Publication number
- JPS57200559A JPS57200559A JP56083981A JP8398181A JPS57200559A JP S57200559 A JPS57200559 A JP S57200559A JP 56083981 A JP56083981 A JP 56083981A JP 8398181 A JP8398181 A JP 8398181A JP S57200559 A JPS57200559 A JP S57200559A
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- thin film
- reach
- monitor
- shutters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56083981A JPS57200559A (en) | 1981-06-01 | 1981-06-01 | Apparatus and method for forming optical thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56083981A JPS57200559A (en) | 1981-06-01 | 1981-06-01 | Apparatus and method for forming optical thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57200559A true JPS57200559A (en) | 1982-12-08 |
| JPS6144153B2 JPS6144153B2 (cs) | 1986-10-01 |
Family
ID=13817708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56083981A Granted JPS57200559A (en) | 1981-06-01 | 1981-06-01 | Apparatus and method for forming optical thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57200559A (cs) |
-
1981
- 1981-06-01 JP JP56083981A patent/JPS57200559A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6144153B2 (cs) | 1986-10-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0121340A3 (en) | Method and apparatus for measuring thin film thickness | |
| SE9302985L (sv) | Övervakning av tunna filmers tjocklek på ett substrat | |
| BE850314A (fr) | Procede de revetement d'un substrat de verre | |
| US3063867A (en) | Deposition and measurement of layer thickness | |
| US2936732A (en) | Production of optical filters | |
| JPS57200559A (en) | Apparatus and method for forming optical thin film | |
| GB1329876A (en) | Optical monitoring apparatus | |
| GB1001268A (en) | Pin-hole evaporation camera | |
| JPS5367684A (en) | Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering | |
| JPS57208041A (en) | Photoconductive target and its manufacture | |
| JPS5385153A (en) | Forming method for light reflective metallic film and heat absorbent material film on face panel inside and its unit | |
| US2375889A (en) | Color grading apparatus | |
| JPS54110938A (en) | Method and apparatus for controlling film thickness | |
| JPS545447A (en) | Recording material | |
| JPS57104806A (en) | Thickness control of grinding painted film | |
| JPS5576064A (en) | Monitor unit for continuous formation of multi-layer coating | |
| JPS55117901A (en) | Measuring method for parallel degree of plane plate surface and reverse face | |
| SU590597A1 (ru) | Устройство дл контрол толщины пленки в процессе напылени | |
| JPS5288085A (en) | Defect detection system | |
| JPS621230Y2 (cs) | ||
| SU1103121A1 (ru) | Способ контрол качества термообработки пленок фоторезиста | |
| JPS57172732A (en) | Relative position detecting device for mask substrate and wafer | |
| JPS5663204A (en) | Monitor device of film thickness | |
| SU397748A1 (ru) | СПОСОБ КОНТРОЛЯ ТОЛЩИНЫ ИЗДЕЛИЙ и ПОКРЫТИЙ | |
| JPS5275349A (en) | System for measuring thickness of coating film |