JPS57200215A - Chemical-resistant protective film having excellent surface hardness - Google Patents
Chemical-resistant protective film having excellent surface hardnessInfo
- Publication number
- JPS57200215A JPS57200215A JP8724281A JP8724281A JPS57200215A JP S57200215 A JPS57200215 A JP S57200215A JP 8724281 A JP8724281 A JP 8724281A JP 8724281 A JP8724281 A JP 8724281A JP S57200215 A JPS57200215 A JP S57200215A
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- compound
- surface hardness
- mixed
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8724281A JPS57200215A (en) | 1981-06-04 | 1981-06-04 | Chemical-resistant protective film having excellent surface hardness |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8724281A JPS57200215A (en) | 1981-06-04 | 1981-06-04 | Chemical-resistant protective film having excellent surface hardness |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57200215A true JPS57200215A (en) | 1982-12-08 |
Family
ID=13909338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8724281A Pending JPS57200215A (en) | 1981-06-04 | 1981-06-04 | Chemical-resistant protective film having excellent surface hardness |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57200215A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100777043B1 (ko) | 2007-05-22 | 2007-11-16 | 주식회사 테스 | 비정질 탄소막 형성 방법 및 이를 이용한 반도체 소자의제조 방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5214600A (en) * | 1975-07-25 | 1977-02-03 | Ozawa Juichiro | Process for the production of a thin film of silicon carbide |
JPS5722112A (en) * | 1980-07-10 | 1982-02-05 | Showa Denko Kk | Preparation of noncrystalline sixc1-x |
-
1981
- 1981-06-04 JP JP8724281A patent/JPS57200215A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5214600A (en) * | 1975-07-25 | 1977-02-03 | Ozawa Juichiro | Process for the production of a thin film of silicon carbide |
JPS5722112A (en) * | 1980-07-10 | 1982-02-05 | Showa Denko Kk | Preparation of noncrystalline sixc1-x |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100777043B1 (ko) | 2007-05-22 | 2007-11-16 | 주식회사 테스 | 비정질 탄소막 형성 방법 및 이를 이용한 반도체 소자의제조 방법 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8500874A1 (es) | Un procedimiento para depositar sobre un substrato de vidriocalentado una pelicula de control solar transparente, absorbente y reflectante. | |
ES457595A1 (es) | Procedimiento para la formacion de recubrimientos metalicos o de compuesto metalico sobre una cara de un sustrato de vidrio. | |
JPS52140267A (en) | Vapor epitaxial crystal growing device | |
GB682105A (en) | Method of making surface-type and point-type rectifiers and crystal-amplifier layers from semiconductor material | |
KR910008164A (ko) | 저온 cvd에 의한 구리 박막의 형성 방법 | |
FR2612946B1 (fr) | Procede et installation pour le depot chimique de revetements ultradurs a temperature moderee | |
JPS57200215A (en) | Chemical-resistant protective film having excellent surface hardness | |
EP0794569A3 (en) | Amorphous carbon film, formation process thereof, and semiconductor device making use of the film | |
JPS52131471A (en) | Surface treatment of substrate | |
EP0492159B1 (en) | Metal growth accelerator shell for the chemical vaporization deposition of diamond | |
US2977389A (en) | Preparation of liquid reaction products of diborane and diolefin hydrocarbons | |
JPS55127080A (en) | Photoconductive element | |
DK418683D0 (da) | Tetrahydrofuranaddukt af et betadiketonatkompleks af 1,1,1,5,5,5-hexafluor-2,4-pentandion med magnesium eller zink | |
JPS5694750A (en) | Heating treatment device | |
JPS5756854A (en) | Nonchargeable roller | |
JPS5568621A (en) | Heat treatment jig | |
GB967565A (en) | Alloys containing pyrolytic graphite | |
MY130196A (en) | Process for the dehydrogenation of organic compounds | |
JPS5727947A (en) | Glass tube | |
GB1008175A (en) | A process for the hydrogenation of unsaturated halogenated organic compounds | |
Backhurst et al. | 549. Homolytic substitution at a saturated carbon atom. Part II. Products of the photoinduced gaseous chlorination of t-butylbenzene | |
JPS52151558A (en) | Manufacture of luminous screen | |
JPS53130974A (en) | Manufacture for silicon thin film | |
JPS56115759A (en) | Preparation of nitrile | |
JPS5789444A (en) | Device for producing metal by vacuum distillation |