JPS57198747A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS57198747A JPS57198747A JP8331981A JP8331981A JPS57198747A JP S57198747 A JPS57198747 A JP S57198747A JP 8331981 A JP8331981 A JP 8331981A JP 8331981 A JP8331981 A JP 8331981A JP S57198747 A JPS57198747 A JP S57198747A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- polyamide
- nitrogen atoms
- basic nitrogen
- hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 4
- 239000004215 Carbon black (E152) Substances 0.000 abstract 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 3
- 239000004952 Polyamide Substances 0.000 abstract 3
- 229930195733 hydrocarbon Natural products 0.000 abstract 3
- 150000002430 hydrocarbons Chemical class 0.000 abstract 3
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 3
- 229920002647 polyamide Polymers 0.000 abstract 3
- 230000001588 bifunctional effect Effects 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 238000012719 thermal polymerization Methods 0.000 abstract 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8331981A JPS57198747A (en) | 1981-05-29 | 1981-05-29 | Photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8331981A JPS57198747A (en) | 1981-05-29 | 1981-05-29 | Photosensitive resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57198747A true JPS57198747A (en) | 1982-12-06 |
| JPS6367177B2 JPS6367177B2 (enrdf_load_stackoverflow) | 1988-12-23 |
Family
ID=13799100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8331981A Granted JPS57198747A (en) | 1981-05-29 | 1981-05-29 | Photosensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57198747A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000327914A (ja) * | 1999-05-24 | 2000-11-28 | Tomoegawa Paper Co Ltd | 芳香族ポリアミド樹脂組成物 |
| JP2010164661A (ja) * | 2009-01-14 | 2010-07-29 | Seiko Pmc Corp | 凸版製造用感光性樹脂組成物 |
-
1981
- 1981-05-29 JP JP8331981A patent/JPS57198747A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000327914A (ja) * | 1999-05-24 | 2000-11-28 | Tomoegawa Paper Co Ltd | 芳香族ポリアミド樹脂組成物 |
| JP2010164661A (ja) * | 2009-01-14 | 2010-07-29 | Seiko Pmc Corp | 凸版製造用感光性樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6367177B2 (enrdf_load_stackoverflow) | 1988-12-23 |
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