JPS57198747A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS57198747A
JPS57198747A JP8331981A JP8331981A JPS57198747A JP S57198747 A JPS57198747 A JP S57198747A JP 8331981 A JP8331981 A JP 8331981A JP 8331981 A JP8331981 A JP 8331981A JP S57198747 A JPS57198747 A JP S57198747A
Authority
JP
Japan
Prior art keywords
compound
polyamide
nitrogen atoms
basic nitrogen
hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8331981A
Other languages
Japanese (ja)
Other versions
JPS6367177B2 (en
Inventor
Kohei Umetani
Toshiaki Fujimura
Akira Tomita
Shinichi Tanaka
Hisashi Uhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP8331981A priority Critical patent/JPS57198747A/en
Publication of JPS57198747A publication Critical patent/JPS57198747A/en
Publication of JPS6367177B2 publication Critical patent/JPS6367177B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: The titled composition, prepared by incorporating a compound containing a photopolymerizable unsaturated bond and a photopolymerization initiator with a polyamide containing basic nitrogen atoms, capable of giving a printed matter without blurred ink even in high-speed printing, having improved mechanical strength, and developable with water.
CONSTITUTION: A photosensitive resin composition, prepared by dissolving a polyamide, containing basic nitrogen atoms, and obtained from a monomer expressed by formulaI(R and R' are H or 1W10C hydrocarbon; R1 and R2 are 1W15C alkylene; A and B are NH2, etc.) with a compound expressed by formula II (X is 1W24C bifunctional hydrocarbon or bifunctional hydrocarbon having O, COO, NH, etc.) at a weight ratio between the compound and the polyamide of 0.02W0.40 and a molar ratio between the compound and the basic nitrogen atoms of 0.05W1.00 and a photosensitizer as a photopolymerization initiator in an amount of 0.01W5wt% based on the total amount of both components and 0.001W2wt% thermal polymerization inhibitor in a solvent, e.g. water or methanol, evaporating only the solvent, and uniformly mixing the components.
COPYRIGHT: (C)1982,JPO&Japio
JP8331981A 1981-05-29 1981-05-29 Photosensitive resin composition Granted JPS57198747A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8331981A JPS57198747A (en) 1981-05-29 1981-05-29 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8331981A JPS57198747A (en) 1981-05-29 1981-05-29 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57198747A true JPS57198747A (en) 1982-12-06
JPS6367177B2 JPS6367177B2 (en) 1988-12-23

Family

ID=13799100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8331981A Granted JPS57198747A (en) 1981-05-29 1981-05-29 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57198747A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327914A (en) * 1999-05-24 2000-11-28 Tomoegawa Paper Co Ltd Aromatic polyamide resin composition
JP2010164661A (en) * 2009-01-14 2010-07-29 Seiko Pmc Corp Photosensitive resin composition for letterpress printing plate production

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327914A (en) * 1999-05-24 2000-11-28 Tomoegawa Paper Co Ltd Aromatic polyamide resin composition
JP2010164661A (en) * 2009-01-14 2010-07-29 Seiko Pmc Corp Photosensitive resin composition for letterpress printing plate production

Also Published As

Publication number Publication date
JPS6367177B2 (en) 1988-12-23

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