JPS57198628A - Inspecting device for pattern - Google Patents
Inspecting device for patternInfo
- Publication number
- JPS57198628A JPS57198628A JP8346881A JP8346881A JPS57198628A JP S57198628 A JPS57198628 A JP S57198628A JP 8346881 A JP8346881 A JP 8346881A JP 8346881 A JP8346881 A JP 8346881A JP S57198628 A JPS57198628 A JP S57198628A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- signal
- end portion
- output
- mized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000004075 alteration Effects 0.000 abstract 1
- 230000007547 defect Effects 0.000 abstract 1
- 238000001514 detection method Methods 0.000 abstract 1
- 230000020169 heat generation Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8346881A JPS57198628A (en) | 1981-05-30 | 1981-05-30 | Inspecting device for pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8346881A JPS57198628A (en) | 1981-05-30 | 1981-05-30 | Inspecting device for pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57198628A true JPS57198628A (en) | 1982-12-06 |
Family
ID=13803296
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8346881A Pending JPS57198628A (en) | 1981-05-30 | 1981-05-30 | Inspecting device for pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57198628A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60201630A (ja) * | 1984-03-23 | 1985-10-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 検査パタ−ンの生成方法 |
US20180067436A1 (en) * | 2016-09-06 | 2018-03-08 | Kabushiki Kaisha Toshiba | Image forming apparatus and pattern reading apparatus |
-
1981
- 1981-05-30 JP JP8346881A patent/JPS57198628A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60201630A (ja) * | 1984-03-23 | 1985-10-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 検査パタ−ンの生成方法 |
JPH032292B2 (ja) * | 1984-03-23 | 1991-01-14 | Intaanashonaru Bijinesu Mashiinzu Corp | |
US20180067436A1 (en) * | 2016-09-06 | 2018-03-08 | Kabushiki Kaisha Toshiba | Image forming apparatus and pattern reading apparatus |
US9971290B2 (en) * | 2016-09-06 | 2018-05-15 | Kabushiki Kaisha Toshiba | Image forming apparatus and pattern reading apparatus |
US10088790B2 (en) | 2016-09-06 | 2018-10-02 | Kabushiki Kaisha Toshiba | Image forming apparatus and pattern reading apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5633830A (en) | Detecting method for mark positioning by electron beam | |
JPS57198628A (en) | Inspecting device for pattern | |
JPS54935A (en) | Pattern detector | |
JPS57210549A (en) | Method of correction attendant on deflection | |
JPS5716309A (en) | Displacement detector | |
JPS5578451A (en) | Inspecting method of contamination in electron-optical system | |
JPS5546182A (en) | Flaw signal generation unit for adjustment for eddy current flaw detector | |
JPS5481782A (en) | Position mark detecting method of electron beam exposure unit | |
JPS539566A (en) | Shape measurement method of electron beams | |
JPS5421277A (en) | Inspection method for pattern | |
JPS546594A (en) | Numerical value controlling ultrasonic flaw detecting system | |
JPS5431766A (en) | Response function measuring method of imaging optical system | |
JPS567429A (en) | Patterning device | |
JPS57104807A (en) | Edge detector for object | |
JPS5324233A (en) | Pattern examination system | |
JPS54136888A (en) | Surface defect detecting device | |
JPS5773606A (en) | Detector for tip shape of fine body | |
JPS55151207A (en) | Detecting method for reference mark position by electron beam exposure | |
JPS52119183A (en) | Electron beam exposure equipment | |
JPS5636058A (en) | Measuring system for surface electric potential | |
JPS5648310A (en) | Controlling system for stacker crane | |
JPS562628A (en) | Method of aligning position through charged beam | |
JPS54153579A (en) | Exposing method of electron beam | |
JPS5240163A (en) | Measurement method | |
JPS5316651A (en) | Displacement detector |