JPS5719768B2 - - Google Patents

Info

Publication number
JPS5719768B2
JPS5719768B2 JP4327877A JP4327877A JPS5719768B2 JP S5719768 B2 JPS5719768 B2 JP S5719768B2 JP 4327877 A JP4327877 A JP 4327877A JP 4327877 A JP4327877 A JP 4327877A JP S5719768 B2 JPS5719768 B2 JP S5719768B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4327877A
Other languages
Japanese (ja)
Other versions
JPS53128333A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4327877A priority Critical patent/JPS53128333A/ja
Priority to GB14818/78A priority patent/GB1592743A/en
Priority to DE19782816226 priority patent/DE2816226A1/de
Priority to US05/896,870 priority patent/US4195999A/en
Publication of JPS53128333A publication Critical patent/JPS53128333A/ja
Publication of JPS5719768B2 publication Critical patent/JPS5719768B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/14Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D231/18One oxygen or sulfur atom
    • C07D231/20One oxygen atom attached in position 3 or 5
    • C07D231/22One oxygen atom attached in position 3 or 5 with aryl radicals attached to ring nitrogen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/14Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D231/28Two oxygen or sulfur atoms
    • C07D231/30Two oxygen or sulfur atoms attached in positions 3 and 5
    • C07D231/32Oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D239/00Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
    • C07D239/02Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings
    • C07D239/24Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
    • C07D239/28Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
    • C07D239/46Two or more oxygen, sulphur or nitrogen atoms
    • C07D239/60Three or more oxygen or sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D239/00Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
    • C07D239/02Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings
    • C07D239/24Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
    • C07D239/28Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
    • C07D239/46Two or more oxygen, sulphur or nitrogen atoms
    • C07D239/60Three or more oxygen or sulfur atoms
    • C07D239/62Barbituric acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/14Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • C07D295/145Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals with the ring nitrogen atoms and the carbon atoms with three bonds to hetero atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155Organic compounds therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP4327877A 1977-04-15 1977-04-15 Prevention of influences of ultraviolet ray upon photosensitive material of silver halogenide Granted JPS53128333A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP4327877A JPS53128333A (en) 1977-04-15 1977-04-15 Prevention of influences of ultraviolet ray upon photosensitive material of silver halogenide
GB14818/78A GB1592743A (en) 1977-04-15 1978-04-14 Silver halide photographic materials containing ultraviolet light absorbing agent
DE19782816226 DE2816226A1 (de) 1977-04-15 1978-04-14 Photographisches silberhalogenidmaterial mit dem gehalt eines ultraviolettlicht absorbierenden mittels sowie verfahren zur verringerung des effektes von ultraviolettlicht auf das photographische silberhalogenidmaterial
US05/896,870 US4195999A (en) 1977-04-15 1978-04-17 Silver halide photographic material containing ultraviolet light absorbing agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4327877A JPS53128333A (en) 1977-04-15 1977-04-15 Prevention of influences of ultraviolet ray upon photosensitive material of silver halogenide

Publications (2)

Publication Number Publication Date
JPS53128333A JPS53128333A (en) 1978-11-09
JPS5719768B2 true JPS5719768B2 (en, 2012) 1982-04-24

Family

ID=12659334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4327877A Granted JPS53128333A (en) 1977-04-15 1977-04-15 Prevention of influences of ultraviolet ray upon photosensitive material of silver halogenide

Country Status (4)

Country Link
US (1) US4195999A (en, 2012)
JP (1) JPS53128333A (en, 2012)
DE (1) DE2816226A1 (en, 2012)
GB (1) GB1592743A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6367768U (en, 2012) * 1986-10-15 1988-05-07

Families Citing this family (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58178351A (ja) * 1982-04-14 1983-10-19 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS58181041A (ja) * 1982-04-16 1983-10-22 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS5919945A (ja) * 1982-07-26 1984-02-01 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS5923344A (ja) * 1982-07-30 1984-02-06 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS5968731A (ja) * 1982-10-12 1984-04-18 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
IT1181384B (it) * 1983-06-07 1987-09-23 Minnesota Mining & Mfg Assorbitore di ultravioletto e materiale fotografico che lo comprende
IT1186757B (it) * 1985-07-11 1987-12-16 Minnesota Mining & Mfg Composti assorbitori di uv 3-amminoallilidenmalononitrile ed elementi fotografici che li congengono
JPS63176239A (ja) * 1987-01-12 1988-07-20 Toyo Commun Equip Co Ltd 堆積紙葉繰り出し装置
GB8819307D0 (en) * 1988-08-13 1988-09-14 Pfizer Ltd Antiarrhythmic agents
US5318939A (en) * 1990-09-17 1994-06-07 Ciba-Geigy Corporation Pressure-sensitive or heat-sensitive recording material
US5772920A (en) * 1995-07-12 1998-06-30 Clariant Finance (Bvi) Limited U.V. absorber compositions
US5786133A (en) * 1996-11-19 1998-07-28 Eastman Kodak Company Antistatic layer for photographic elements
FR2815961B1 (fr) 2000-10-26 2008-11-28 Centre Nat Rech Scient Nouveaux intermediaires utiles pour la synthese de retinoides
DE602005014149D1 (de) * 2004-09-20 2009-06-04 Oreal Silanmerocyaninsulphonderivate, photoprotektive zusammensetzungen damit, verwendung davon als uv-filter
FR2886144B1 (fr) * 2005-05-27 2007-06-29 Oreal Procede de photostabilisation d'un derive de dibenzoylmethane par un derive sulfone de merocyanine ; compositions cosmetiques photoprotectrices contenant cette associaton.
US8129309B2 (en) 2007-03-29 2012-03-06 Fujifilm Corporation Heat-sensitive transfer sheet for use in heat-sensitive transfer system and image-forming method using heat-sensitive transfer system
US8119562B2 (en) 2007-03-29 2012-02-21 Fujifilm Corporation Heat-sensitive transfer sheet and image-forming method using heat-sensitive transfer system
EP1974948A3 (en) 2007-03-29 2012-02-08 FUJIFILM Corporation Image-forming method using heat-sensitive transfer system
JP2008273641A (ja) 2007-04-25 2008-11-13 Fujifilm Corp 感熱転写受像シート用紙管、感熱転写受像シートのロール形態加工物、及び画像形成方法
WO2009038463A1 (en) * 2007-09-18 2009-03-26 Fujifilm Manufacturing Europe B.V. Uv absorbing compounds
JP5147499B2 (ja) 2008-02-13 2013-02-20 富士フイルム株式会社 感光性着色組成物、並びにカラーフィルタ及びその製造方法
JP5155920B2 (ja) 2008-03-31 2013-03-06 富士フイルム株式会社 感光性透明樹脂組成物、カラーフィルタの製造方法及びカラーフィルター
JP2009270062A (ja) 2008-05-09 2009-11-19 Fujifilm Corp 紫外線吸収剤組成物
JP5274151B2 (ja) 2008-08-21 2013-08-28 富士フイルム株式会社 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに、固体撮像素子
JP5701576B2 (ja) 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
JP2011184414A (ja) * 2010-03-11 2011-09-22 Fujifilm Corp ポリマーフィルム、紫外線吸収剤、メロシアニン系化合物、及びメロシアニン系化合物の製造方法
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FR3117825A1 (fr) 2020-12-18 2022-06-24 L'oreal Composition cosmétique ou dermatologique comprenant une mérocyanine, un filtre UV triazine, et un polysaccharide modifié par des chaînes hydrophobes
FR3130595B1 (fr) 2021-12-17 2025-03-21 Oreal Composition cosmétique ou dermatologique comprenant au moins une mérocyanine et un hydrotrope
FR3130593B1 (fr) 2021-12-17 2025-04-25 Oreal Composition cosmétique ou dermatologique comprenant une mérocyanine et le dipropylène glycol
FR3130598B1 (fr) 2021-12-17 2025-04-25 Oreal Composition cosmétique ou dermatologique comprenant une mérocyanine et du tétra hydroxycinnamate de di-t-butyle pentaérythrityle
FR3130599B1 (fr) 2021-12-17 2025-02-14 Oreal Composition cosmétique ou dermatologique comprenant une mérocyanine et une gamma-butyrolactone et/ou un gamma-butyrolactame
FR3130597B1 (fr) 2021-12-17 2025-07-18 Oreal Composition cosmétique ou dermatologique comprenant une mérocyanine et au moins un diol comportant de 4 à 7 atomes de carbone
FR3130594B1 (fr) 2021-12-17 2025-04-25 Oreal Composition cosmétique ou dermatologique comprenant une mérocyanine et du resvératrol et/ou un dérivé de resvératrol
FR3141059A1 (fr) 2022-10-20 2024-04-26 L'oreal Composition cosmétique ou dermatologique comprenant une mérocyanine et une gamma-butyrolactone et/ou un gamma-butyrolactame
EP4447897A1 (en) 2021-12-17 2024-10-23 L'oreal Cosmetic or dermatological composition comprising a merocyanine and a gamma-butyrolactone and/or a gamma-butyrolactam
FR3132637B1 (fr) 2022-02-15 2025-05-02 Oreal Composition cosmétique ou dermatologique comprenant une mérocyanine et un complexe polyionique
FR3142344A1 (fr) 2022-11-30 2024-05-31 L'oreal Composition à base de rétinol
FR3149777A1 (fr) 2023-06-16 2024-12-20 L'oreal Composition cosmétique ou dermatologique aqueuse comprenant une mérocyanine et un filtre UV hydrosoluble

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2322005A (en) * 1939-12-29 1943-06-15 Eastman Kodak Co Photographic bleach-out layer
US3278448A (en) * 1960-05-17 1966-10-11 Bayer Ag Ultra-violet protective light filter
DE1963995A1 (de) * 1969-12-20 1971-07-01 Agfa Gevaert Ag Photographische Schichten mit einem Gehalt an ultraviolettes Licht absorbierenden Verbindungen
US4045229A (en) * 1974-09-17 1977-08-30 Eastman Kodak Company Novel UV absorbing compounds and photographic elements containing UV absorbing compounds

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6367768U (en, 2012) * 1986-10-15 1988-05-07

Also Published As

Publication number Publication date
JPS53128333A (en) 1978-11-09
DE2816226A1 (de) 1978-10-26
GB1592743A (en) 1981-07-08
US4195999A (en) 1980-04-01

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