JPS57194256A - Sputtering device - Google Patents

Sputtering device

Info

Publication number
JPS57194256A
JPS57194256A JP7875181A JP7875181A JPS57194256A JP S57194256 A JPS57194256 A JP S57194256A JP 7875181 A JP7875181 A JP 7875181A JP 7875181 A JP7875181 A JP 7875181A JP S57194256 A JPS57194256 A JP S57194256A
Authority
JP
Japan
Prior art keywords
targets
magnets
annular shape
use efficiency
different polarities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7875181A
Other languages
English (en)
Other versions
JPS5943547B2 (ja
Inventor
Hisaharu Obinata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP7875181A priority Critical patent/JPS5943547B2/ja
Publication of JPS57194256A publication Critical patent/JPS57194256A/ja
Publication of JPS5943547B2 publication Critical patent/JPS5943547B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP7875181A 1981-05-26 1981-05-26 スパツタリング装置 Expired JPS5943547B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7875181A JPS5943547B2 (ja) 1981-05-26 1981-05-26 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7875181A JPS5943547B2 (ja) 1981-05-26 1981-05-26 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS57194256A true JPS57194256A (en) 1982-11-29
JPS5943547B2 JPS5943547B2 (ja) 1984-10-23

Family

ID=13670591

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7875181A Expired JPS5943547B2 (ja) 1981-05-26 1981-05-26 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS5943547B2 (ja)

Also Published As

Publication number Publication date
JPS5943547B2 (ja) 1984-10-23

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