JPS5719379A - Dry etching device having upper water cooled electrode - Google Patents
Dry etching device having upper water cooled electrodeInfo
- Publication number
- JPS5719379A JPS5719379A JP9426680A JP9426680A JPS5719379A JP S5719379 A JPS5719379 A JP S5719379A JP 9426680 A JP9426680 A JP 9426680A JP 9426680 A JP9426680 A JP 9426680A JP S5719379 A JPS5719379 A JP S5719379A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- etched
- dry etching
- plate
- upper water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title abstract 4
- 238000001312 dry etching Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 abstract 7
- 238000005530 etching Methods 0.000 abstract 2
- 238000001816 cooling Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9426680A JPS5719379A (en) | 1980-07-09 | 1980-07-09 | Dry etching device having upper water cooled electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9426680A JPS5719379A (en) | 1980-07-09 | 1980-07-09 | Dry etching device having upper water cooled electrode |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5719379A true JPS5719379A (en) | 1982-02-01 |
JPS6248758B2 JPS6248758B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-10-15 |
Family
ID=14105469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9426680A Granted JPS5719379A (en) | 1980-07-09 | 1980-07-09 | Dry etching device having upper water cooled electrode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5719379A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61260637A (ja) * | 1985-05-15 | 1986-11-18 | Mitsubishi Electric Corp | ドライエツチング装置 |
JPH01186621A (ja) * | 1987-07-16 | 1989-07-26 | Texas Instr Inc <Ti> | 処理装置及び方法 |
-
1980
- 1980-07-09 JP JP9426680A patent/JPS5719379A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61260637A (ja) * | 1985-05-15 | 1986-11-18 | Mitsubishi Electric Corp | ドライエツチング装置 |
JPH01186621A (ja) * | 1987-07-16 | 1989-07-26 | Texas Instr Inc <Ti> | 処理装置及び方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6248758B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-10-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5767173A (en) | Plasma etching device | |
JPS57111031A (en) | Sputtering device | |
JPS5719379A (en) | Dry etching device having upper water cooled electrode | |
JPS57135836A (en) | Glow discharge treatment | |
JPS56131930A (en) | Controlling device of wafer temperature | |
JPS5437581A (en) | Wafer etching device | |
JPS558055A (en) | Liquid phase breeding | |
JPS5384684A (en) | Plasma etching device | |
JPS547288A (en) | Observation window for sealed container | |
JPS5443469A (en) | Manufacture of semiconductor device | |
ES440846A1 (es) | Perfeccionamientos en dispositivos para la obtencion de ca- lor a partir de energia solar. | |
JPS556318A (en) | Polarizing plate affixing device | |
JPS5375866A (en) | Wafer transfer device | |
JPS5792850A (en) | Semiconductor chip | |
JPS562634A (en) | Parallel flat plate type plasma etching device | |
JPS6442843A (en) | Semiconductor device | |
JPS5751287A (en) | Plating apparatus | |
JPS54131872A (en) | Forming method for dielectric layer of semiconductor device | |
JPS54105859A (en) | Cleaner | |
JPS5612765A (en) | Mos dynamic memory cell | |
JPS5719525A (en) | Temperature sensor for kitchen range | |
JPS5723757A (en) | Solar heat collector | |
JPS5544734A (en) | Semiconductor device | |
JPS53147479A (en) | Production of semiconductor device | |
JPS57174113A (en) | Spark recovering device |