JPS57178377A - Method of producing field effect transistor - Google Patents
Method of producing field effect transistorInfo
- Publication number
- JPS57178377A JPS57178377A JP57001072A JP107282A JPS57178377A JP S57178377 A JPS57178377 A JP S57178377A JP 57001072 A JP57001072 A JP 57001072A JP 107282 A JP107282 A JP 107282A JP S57178377 A JPS57178377 A JP S57178377A
- Authority
- JP
- Japan
- Prior art keywords
- field effect
- effect transistor
- producing field
- producing
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005669 field effect Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2258—Diffusion into or out of AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
- H01L29/812—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/255,187 US4389768A (en) | 1981-04-17 | 1981-04-17 | Self-aligned process for fabricating gallium arsenide metal-semiconductor field effect transistors |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57178377A true JPS57178377A (en) | 1982-11-02 |
JPS634955B2 JPS634955B2 (ja) | 1988-02-01 |
Family
ID=22967222
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57001072A Granted JPS57178377A (en) | 1981-04-17 | 1982-01-08 | Method of producing field effect transistor |
Country Status (4)
Country | Link |
---|---|
US (1) | US4389768A (ja) |
EP (1) | EP0063221B1 (ja) |
JP (1) | JPS57178377A (ja) |
DE (1) | DE3264480D1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57178373A (en) * | 1981-04-27 | 1982-11-02 | Sumitomo Electric Ind Ltd | Schottky gate field-effect transistor |
JPS59114871A (ja) * | 1982-12-21 | 1984-07-03 | Toshiba Corp | シヨツトキ−ゲ−ト型GaAs電界効果トランジスタの製造方法 |
US5122075A (en) * | 1991-05-17 | 1992-06-16 | Amp Incorporated | Electrical connector with improved retention feature |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2525028A1 (fr) * | 1982-04-09 | 1983-10-14 | Chauffage Nouvelles Tech | Procede de fabrication de transistors a effet de champ, en gaas, par implantations ioniques et transistors ainsi obtenus |
JPS5950567A (ja) * | 1982-09-16 | 1984-03-23 | Hitachi Ltd | 電界効果トランジスタの製造方法 |
JPS6046074A (ja) * | 1983-08-24 | 1985-03-12 | Toshiba Corp | 電界効果トランジスタの製造方法 |
JPH0693509B2 (ja) * | 1983-08-26 | 1994-11-16 | シャープ株式会社 | 薄膜トランジスタ |
US4636822A (en) * | 1984-08-27 | 1987-01-13 | International Business Machines Corporation | GaAs short channel lightly doped drain MESFET structure and fabrication |
US4855246A (en) * | 1984-08-27 | 1989-08-08 | International Business Machines Corporation | Fabrication of a gaas short channel lightly doped drain mesfet |
US4759822A (en) * | 1984-10-12 | 1988-07-26 | Triquint Semiconductor Inc. | Methods for producing an aperture in a surface |
US4592793A (en) * | 1985-03-15 | 1986-06-03 | International Business Machines Corporation | Process for diffusing impurities into a semiconductor body vapor phase diffusion of III-V semiconductor substrates |
JPS61256675A (ja) * | 1985-05-09 | 1986-11-14 | Sumitomo Electric Ind Ltd | シヨツトキゲ−ト電界効果トランジスタの製造方法 |
US4710478A (en) * | 1985-05-20 | 1987-12-01 | United States Of America As Represented By The Secretary Of The Navy | Method for making germanium/gallium arsenide high mobility complementary logic transistors |
US4632713A (en) * | 1985-07-31 | 1986-12-30 | Texas Instruments Incorporated | Process of making Schottky barrier devices formed by diffusion before contacting |
JPH02295855A (ja) * | 1989-05-11 | 1990-12-06 | Isamu Miura | 紙揃え装置 |
US4927773A (en) * | 1989-06-05 | 1990-05-22 | Santa Barbara Research Center | Method of minimizing implant-related damage to a group II-VI semiconductor material |
US5278430A (en) * | 1989-11-18 | 1994-01-11 | Kabushiki Kaisha Toshiba | Complementary semiconductor device using diamond thin film and the method of manufacturing this device |
JPH0661840U (ja) * | 1993-02-02 | 1994-09-02 | 新王子製紙株式会社 | 平判紙の積替装置 |
US5759880A (en) * | 1997-01-02 | 1998-06-02 | Motorola, Inc. | Resistless methods of fabricating FETs |
US6861758B2 (en) * | 2002-08-30 | 2005-03-01 | Intel Corporation | Structure and manufacturing process of localized shunt to reduce electromigration failure of copper dual damascene process |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5039879A (ja) * | 1973-08-13 | 1975-04-12 | ||
JPS5591881A (en) * | 1978-12-29 | 1980-07-11 | Ibm | Method of fabricating schottky barrier fet |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3479234A (en) * | 1967-05-01 | 1969-11-18 | Gen Electric | Method of producing field effect transistors |
US3574010A (en) * | 1968-12-30 | 1971-04-06 | Texas Instruments Inc | Fabrication of metal insulator semiconductor field effect transistors |
US3749614A (en) * | 1970-09-14 | 1973-07-31 | Rca Corp | Fabrication of semiconductor devices |
US3713912A (en) * | 1971-02-11 | 1973-01-30 | Bell Telephone Labor Inc | Gallium arsenide field effect structure |
US3856588A (en) * | 1972-10-11 | 1974-12-24 | Matsushita Electric Ind Co Ltd | Stabilizing insulation for diffused group iii-v devices |
US3855690A (en) * | 1972-12-26 | 1974-12-24 | Westinghouse Electric Corp | Application of facet-growth to self-aligned schottky barrier gate field effect transistors |
US3943622A (en) * | 1972-12-26 | 1976-03-16 | Westinghouse Electric Corporation | Application of facet-growth to self-aligned Shottky barrier gate field effect transistors |
JPS5274285A (en) * | 1975-12-17 | 1977-06-22 | Hitachi Ltd | Production of semiconductor device |
US4111725A (en) * | 1977-05-06 | 1978-09-05 | Bell Telephone Laboratories, Incorporated | Selective lift-off technique for fabricating gaas fets |
US4287661A (en) * | 1980-03-26 | 1981-09-08 | International Business Machines Corporation | Method for making an improved polysilicon conductor structure utilizing reactive-ion etching and thermal oxidation |
-
1981
- 1981-04-17 US US06/255,187 patent/US4389768A/en not_active Expired - Lifetime
-
1982
- 1982-01-08 JP JP57001072A patent/JPS57178377A/ja active Granted
- 1982-02-25 DE DE8282101421T patent/DE3264480D1/de not_active Expired
- 1982-02-25 EP EP82101421A patent/EP0063221B1/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5039879A (ja) * | 1973-08-13 | 1975-04-12 | ||
JPS5591881A (en) * | 1978-12-29 | 1980-07-11 | Ibm | Method of fabricating schottky barrier fet |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57178373A (en) * | 1981-04-27 | 1982-11-02 | Sumitomo Electric Ind Ltd | Schottky gate field-effect transistor |
JPS59114871A (ja) * | 1982-12-21 | 1984-07-03 | Toshiba Corp | シヨツトキ−ゲ−ト型GaAs電界効果トランジスタの製造方法 |
US5122075A (en) * | 1991-05-17 | 1992-06-16 | Amp Incorporated | Electrical connector with improved retention feature |
Also Published As
Publication number | Publication date |
---|---|
EP0063221A2 (en) | 1982-10-27 |
EP0063221B1 (en) | 1985-07-03 |
JPS634955B2 (ja) | 1988-02-01 |
DE3264480D1 (en) | 1985-08-08 |
EP0063221A3 (en) | 1983-07-20 |
US4389768A (en) | 1983-06-28 |
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SU1179923A3 (ru) | "cпocoб пoлучehия aзoлилпehtehпpoизboдhыx" |