JPS57178343A - Semiconductor wafer positioning method and device - Google Patents

Semiconductor wafer positioning method and device

Info

Publication number
JPS57178343A
JPS57178343A JP57061853A JP6185382A JPS57178343A JP S57178343 A JPS57178343 A JP S57178343A JP 57061853 A JP57061853 A JP 57061853A JP 6185382 A JP6185382 A JP 6185382A JP S57178343 A JPS57178343 A JP S57178343A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
positioning method
wafer positioning
semiconductor
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57061853A
Other languages
English (en)
Other versions
JPH0145736B2 (ja
Inventor
Fuerudoman Maachin
Deibuitsudo Howaito Aran
Roorensu Howaito Donarudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of JPS57178343A publication Critical patent/JPS57178343A/ja
Publication of JPH0145736B2 publication Critical patent/JPH0145736B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57061853A 1981-04-15 1982-04-15 Semiconductor wafer positioning method and device Granted JPS57178343A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/254,486 US4398824A (en) 1981-04-15 1981-04-15 Wafer tilt compensation in zone plate alignment system

Publications (2)

Publication Number Publication Date
JPS57178343A true JPS57178343A (en) 1982-11-02
JPH0145736B2 JPH0145736B2 (ja) 1989-10-04

Family

ID=22964476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57061853A Granted JPS57178343A (en) 1981-04-15 1982-04-15 Semiconductor wafer positioning method and device

Country Status (10)

Country Link
US (1) US4398824A (ja)
JP (1) JPS57178343A (ja)
BE (1) BE892840A (ja)
CA (1) CA1166363A (ja)
DE (1) DE3213338C2 (ja)
FR (1) FR2504288B1 (ja)
GB (1) GB2098728B (ja)
HK (1) HK7486A (ja)
IT (1) IT1205252B (ja)
NL (1) NL8201571A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007192813A (ja) * 2005-12-22 2007-08-02 Matsushita Electric Ind Co Ltd 界面位置測定方法および測定装置、層厚測定方法および測定装置、並びに、光ディスクの製造方法および製造装置

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3306840A1 (de) * 1983-02-26 1984-09-06 GdA Gesellschaft für digitale Automation mbH, 8000 München Messanordnung zum justieren des werkzeugflansches eines industrieroboters
US4636080A (en) * 1984-05-07 1987-01-13 At&T Bell Laboratories Two-dimensional imaging with line arrays
JPH0814484B2 (ja) * 1985-04-09 1996-02-14 株式会社ニコン パタ−ン位置測定装置
US4790642A (en) * 1986-12-01 1988-12-13 Gca Corporation/Tropel Division Integrated metrology for microlithographic objective reducing lens
US5325176A (en) * 1988-02-16 1994-06-28 Canon Kabushiki Kaisha Position detecting method and apparatus including Fraunhofer diffraction detector
US5327221A (en) * 1988-02-16 1994-07-05 Canon Kabushiki Kaisha Device for detecting positional relationship between two objects
US5294980A (en) * 1988-03-24 1994-03-15 Canon Kabushiki Kaisha Positioning detecting method and apparatus
US5235408A (en) * 1988-09-05 1993-08-10 Canon Kabushiki Kaisha Position detecting method and apparatus
JP2626076B2 (ja) * 1988-09-09 1997-07-02 キヤノン株式会社 位置検出装置
US5155370A (en) * 1988-09-09 1992-10-13 Canon Kabushiki Kaisha Device for detecting the relative position of first and second objects
JP2546350B2 (ja) * 1988-09-09 1996-10-23 キヤノン株式会社 位置合わせ装置
EP0358511B1 (en) * 1988-09-09 2001-07-18 Canon Kabushiki Kaisha Device for detecting positional relationship between two objects
JP2734004B2 (ja) * 1988-09-30 1998-03-30 キヤノン株式会社 位置合わせ装置
JP2704001B2 (ja) * 1989-07-18 1998-01-26 キヤノン株式会社 位置検出装置
DE69013790T2 (de) * 1989-08-04 1995-05-04 Canon Kk Verfahren und Vorrichtung zur Positionsbestimmung.
DE4135959C2 (de) * 1991-10-31 1994-01-20 Leica Ag Heerbrugg Verfahren zur Messung der Neigungen von Grenzflächen in einem optischen System
FR2789068B1 (fr) 1999-02-03 2001-03-16 Optique Et Microsystemes Sa Dispositif d'alignement pour l'assemblage de microsystemes et pour la micro distribution sur microsystemes ou sur microcomposants biotechnologiques
DE19963345A1 (de) 1999-12-27 2001-07-05 Leica Microsystems Optische Messanordnung und Verfahren zur Neigungsmessung
US6778266B2 (en) * 2002-01-12 2004-08-17 Taiwan Semiconductor Manufacturing Co., Ltd Semiconductor wafer tilt monitoring on semiconductor fabrication equipment plate
TWI251722B (en) 2002-09-20 2006-03-21 Asml Netherlands Bv Device inspection
DE102013207243B4 (de) * 2013-04-22 2019-10-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur herstellung einer struktur aus aushärtbarem material durch abformung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3990798A (en) * 1975-03-07 1976-11-09 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007192813A (ja) * 2005-12-22 2007-08-02 Matsushita Electric Ind Co Ltd 界面位置測定方法および測定装置、層厚測定方法および測定装置、並びに、光ディスクの製造方法および製造装置

Also Published As

Publication number Publication date
FR2504288B1 (fr) 1985-06-28
GB2098728B (en) 1985-06-05
US4398824A (en) 1983-08-16
FR2504288A1 (fr) 1982-10-22
GB2098728A (en) 1982-11-24
CA1166363A (en) 1984-04-24
DE3213338A1 (de) 1982-11-04
BE892840A (fr) 1982-08-02
HK7486A (en) 1986-02-07
JPH0145736B2 (ja) 1989-10-04
NL8201571A (nl) 1982-11-01
IT1205252B (it) 1989-03-15
IT8220712A0 (it) 1982-04-13
DE3213338C2 (de) 1986-07-10

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