JPS57172337A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS57172337A JPS57172337A JP5693581A JP5693581A JPS57172337A JP S57172337 A JPS57172337 A JP S57172337A JP 5693581 A JP5693581 A JP 5693581A JP 5693581 A JP5693581 A JP 5693581A JP S57172337 A JPS57172337 A JP S57172337A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- formula
- photosensitive
- resin composition
- aliphatic hydrocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 239000011347 resin Substances 0.000 abstract 4
- 229920005989 resin Polymers 0.000 abstract 4
- 125000000252 2-trans,6-trans-farnesyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])C([H])([H])C([H])=C(C([H])([H])[H])C([H])([H])C([H])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 abstract 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5693581A JPS57172337A (en) | 1981-04-17 | 1981-04-17 | Photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5693581A JPS57172337A (en) | 1981-04-17 | 1981-04-17 | Photosensitive resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57172337A true JPS57172337A (en) | 1982-10-23 |
| JPH0337174B2 JPH0337174B2 (en, 2012) | 1991-06-04 |
Family
ID=13041372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5693581A Granted JPS57172337A (en) | 1981-04-17 | 1981-04-17 | Photosensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57172337A (en, 2012) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61217034A (ja) * | 1985-03-22 | 1986-09-26 | Fuji Photo Film Co Ltd | 感光性組成物および感光性材料 |
| JPS61218616A (ja) * | 1985-03-02 | 1986-09-29 | チバ‐ガイギー アクチエンゲゼルシヤフト | 変性フエノール樹脂生成物、その製造方法及び該化合物を使用する画像形成方法 |
| JPS61228439A (ja) * | 1985-04-01 | 1986-10-11 | Fuji Photo Film Co Ltd | 感光性組成物および感光性材料 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5271224A (en) * | 1975-12-11 | 1977-06-14 | Toshiba Corp | Positive type light sensitive composition |
| JPS5359504A (en) * | 1976-11-05 | 1978-05-29 | Tokyo Shibaura Electric Co | Positive photoresist material |
-
1981
- 1981-04-17 JP JP5693581A patent/JPS57172337A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5271224A (en) * | 1975-12-11 | 1977-06-14 | Toshiba Corp | Positive type light sensitive composition |
| JPS5359504A (en) * | 1976-11-05 | 1978-05-29 | Tokyo Shibaura Electric Co | Positive photoresist material |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61218616A (ja) * | 1985-03-02 | 1986-09-29 | チバ‐ガイギー アクチエンゲゼルシヤフト | 変性フエノール樹脂生成物、その製造方法及び該化合物を使用する画像形成方法 |
| JPS61217034A (ja) * | 1985-03-22 | 1986-09-26 | Fuji Photo Film Co Ltd | 感光性組成物および感光性材料 |
| JPS61228439A (ja) * | 1985-04-01 | 1986-10-11 | Fuji Photo Film Co Ltd | 感光性組成物および感光性材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0337174B2 (en, 2012) | 1991-06-04 |
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