JPS5717179A - Manufacture of semiconductor device for generating photoelectromotive force - Google Patents
Manufacture of semiconductor device for generating photoelectromotive forceInfo
- Publication number
- JPS5717179A JPS5717179A JP8027181A JP8027181A JPS5717179A JP S5717179 A JPS5717179 A JP S5717179A JP 8027181 A JP8027181 A JP 8027181A JP 8027181 A JP8027181 A JP 8027181A JP S5717179 A JPS5717179 A JP S5717179A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- phase method
- semiconductor layers
- reactive gas
- silane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 5
- 230000006837 decompression Effects 0.000 abstract 3
- 239000007792 gaseous phase Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 abstract 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 229910052786 argon Inorganic materials 0.000 abstract 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 229910000077 silane Inorganic materials 0.000 abstract 1
- 239000005049 silicon tetrachloride Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0368—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors
- H01L31/03682—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including polycrystalline semiconductors including only elements of Group IV of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8027181A JPS5717179A (en) | 1981-05-17 | 1981-05-17 | Manufacture of semiconductor device for generating photoelectromotive force |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8027181A JPS5717179A (en) | 1981-05-17 | 1981-05-17 | Manufacture of semiconductor device for generating photoelectromotive force |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49071738A Division JPS51890A (en) | 1974-06-20 | 1974-06-20 | Handotaisochi oyobi sonosakuseihoho |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57070146A Division JPS57184258A (en) | 1982-04-26 | 1982-04-26 | Manufacture of photoelectric conversion semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5717179A true JPS5717179A (en) | 1982-01-28 |
Family
ID=13713620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8027181A Pending JPS5717179A (en) | 1981-05-17 | 1981-05-17 | Manufacture of semiconductor device for generating photoelectromotive force |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5717179A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57184258A (en) * | 1982-04-26 | 1982-11-12 | Shunpei Yamazaki | Manufacture of photoelectric conversion semiconductor device |
| JPS63166680U (ja) * | 1987-04-20 | 1988-10-31 |
-
1981
- 1981-05-17 JP JP8027181A patent/JPS5717179A/ja active Pending
Non-Patent Citations (1)
| Title |
|---|
| SOLID STATE ELECTRONICS=1968 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57184258A (en) * | 1982-04-26 | 1982-11-12 | Shunpei Yamazaki | Manufacture of photoelectric conversion semiconductor device |
| JPS63166680U (ja) * | 1987-04-20 | 1988-10-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EG15981A (en) | Method of making amorphous semiconductor alloys and devices using microwave energy | |
| JPS5767938A (en) | Production of photoconductive member | |
| ES8602974A1 (es) | Un procedimiento de depositar una pelicula de aleacion semi-conductora amorfa sobre un sustrato | |
| JPS5777021A (en) | Manufacture of amorphous silicon | |
| JPS61234534A (ja) | 窒化珪素被膜作成方法 | |
| GB1452637A (en) | Diffusion of impurities into a semiconductor | |
| JPS5717179A (en) | Manufacture of semiconductor device for generating photoelectromotive force | |
| JPS5659694A (en) | Manufacture of thin film | |
| JPS5534470A (en) | Production for solar battery | |
| JPS6414927A (en) | Forming method of silicon nitride film or silicon oxynitride film | |
| JPS5547381A (en) | Plasma etching method | |
| JPS5523025A (en) | Production of polycrystal silicon | |
| ES474771A1 (es) | procedimiento de fabricacion de silicio policristalino | |
| JPS5762537A (en) | Forming method for film | |
| JPS5723216A (en) | Manufacture of plasma reactor and semiconductor element | |
| JPS5799732A (en) | Semi-amorphous semiconductor | |
| JPS57128922A (en) | Manufacture of semiconductor device | |
| JPS5717183A (en) | Semiconductor device for generating photoelectromotive force | |
| TW373261B (en) | Method of processing gate electrode etching integrated circuit | |
| JPS6410617A (en) | Formation of polycrystalline silicon film | |
| JPS6414928A (en) | Amorphous semiconductor element and manufacture thereof | |
| JPS5526681A (en) | Semiconductor device and its manufacturing method | |
| JPS5745225A (en) | Semiamorphous semiconductor | |
| KR970017960A (ko) | 대 표면 영역 실리콘 기판 | |
| JPS57155780A (en) | Photo-electro transducer and its manufacture |