JPS57170929A - Photosensitive polymeric composition - Google Patents
Photosensitive polymeric compositionInfo
- Publication number
- JPS57170929A JPS57170929A JP4277982A JP4277982A JPS57170929A JP S57170929 A JPS57170929 A JP S57170929A JP 4277982 A JP4277982 A JP 4277982A JP 4277982 A JP4277982 A JP 4277982A JP S57170929 A JPS57170929 A JP S57170929A
- Authority
- JP
- Japan
- Prior art keywords
- 100pts
- alkylene
- lower alkyl
- polyamic acid
- organic group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000002947 alkylene group Chemical group 0.000 abstract 2
- -1 amine compound Chemical class 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 125000000962 organic group Chemical group 0.000 abstract 2
- 229920005575 poly(amic acid) Polymers 0.000 abstract 2
- 239000004642 Polyimide Substances 0.000 abstract 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 abstract 1
- 230000001588 bifunctional effect Effects 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4277982A JPS57170929A (en) | 1982-03-19 | 1982-03-19 | Photosensitive polymeric composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4277982A JPS57170929A (en) | 1982-03-19 | 1982-03-19 | Photosensitive polymeric composition |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56054408A Division JPS57168942A (en) | 1981-04-13 | 1981-04-13 | Photosensitive polymer composition |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29534590A Division JPH03179057A (ja) | 1990-11-02 | 1990-11-02 | パターン形成法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57170929A true JPS57170929A (en) | 1982-10-21 |
| JPH0336861B2 JPH0336861B2 (enrdf_load_stackoverflow) | 1991-06-03 |
Family
ID=12645450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4277982A Granted JPS57170929A (en) | 1982-03-19 | 1982-03-19 | Photosensitive polymeric composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57170929A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62267358A (ja) * | 1986-05-14 | 1987-11-20 | Hitachi Chem Co Ltd | 感光性重合体組成物 |
| JPS63155141A (ja) * | 1986-12-19 | 1988-06-28 | Hitachi Ltd | 感光性重合体組成物 |
| JPH02149850A (ja) * | 1988-12-01 | 1990-06-08 | Hitachi Chem Co Ltd | 感光性重合体組成物 |
| JPH03168214A (ja) * | 1989-11-28 | 1991-07-22 | Hitachi Ltd | 半導体装置の製造方法 |
| US7439005B2 (en) | 2004-02-26 | 2008-10-21 | Nec Corporation | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
| US8231959B2 (en) | 2004-01-14 | 2012-07-31 | Hitachi Chemical Dupont Microsystems Ltd. | Photosensitive polymer composition, method of producing pattern and electronic parts |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3675368B2 (ja) * | 1993-09-03 | 2005-07-27 | 日立化成工業株式会社 | レリーフパターン、半導体用バッファコート膜及び多層配線板の層間絶縁膜の製造法 |
| JP3722155B2 (ja) * | 1993-09-03 | 2005-11-30 | 日立化成工業株式会社 | 感光性樹脂組成物 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54145794A (en) * | 1978-04-14 | 1979-11-14 | Toray Ind Inc | Heat-resistant photosensitive material |
| JPS5624344A (en) * | 1979-08-06 | 1981-03-07 | Hitachi Ltd | Photosensitive heat-resistant polymer composition |
| JPS57168942A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | Photosensitive polymer composition |
-
1982
- 1982-03-19 JP JP4277982A patent/JPS57170929A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54145794A (en) * | 1978-04-14 | 1979-11-14 | Toray Ind Inc | Heat-resistant photosensitive material |
| JPS5624344A (en) * | 1979-08-06 | 1981-03-07 | Hitachi Ltd | Photosensitive heat-resistant polymer composition |
| JPS57168942A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | Photosensitive polymer composition |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62267358A (ja) * | 1986-05-14 | 1987-11-20 | Hitachi Chem Co Ltd | 感光性重合体組成物 |
| JPS63155141A (ja) * | 1986-12-19 | 1988-06-28 | Hitachi Ltd | 感光性重合体組成物 |
| JPH02149850A (ja) * | 1988-12-01 | 1990-06-08 | Hitachi Chem Co Ltd | 感光性重合体組成物 |
| JPH03168214A (ja) * | 1989-11-28 | 1991-07-22 | Hitachi Ltd | 半導体装置の製造方法 |
| US8231959B2 (en) | 2004-01-14 | 2012-07-31 | Hitachi Chemical Dupont Microsystems Ltd. | Photosensitive polymer composition, method of producing pattern and electronic parts |
| US8852726B2 (en) | 2004-01-14 | 2014-10-07 | Hitachi Chemical Dupont Microsystems Ltd. | Photosensitive polymer composition, method of producing pattern and electronic parts |
| US7439005B2 (en) | 2004-02-26 | 2008-10-21 | Nec Corporation | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0336861B2 (enrdf_load_stackoverflow) | 1991-06-03 |
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