JPS57165834A - Peeling solution for cured film of photopolymerizing composition - Google Patents

Peeling solution for cured film of photopolymerizing composition

Info

Publication number
JPS57165834A
JPS57165834A JP5210781A JP5210781A JPS57165834A JP S57165834 A JPS57165834 A JP S57165834A JP 5210781 A JP5210781 A JP 5210781A JP 5210781 A JP5210781 A JP 5210781A JP S57165834 A JPS57165834 A JP S57165834A
Authority
JP
Japan
Prior art keywords
soln
peeling
cured film
compound
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5210781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS645695B2 (enrdf_load_stackoverflow
Inventor
Noboru Sugasawa
Hajime Kakumaru
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP5210781A priority Critical patent/JPS57165834A/ja
Publication of JPS57165834A publication Critical patent/JPS57165834A/ja
Publication of JPS645695B2 publication Critical patent/JPS645695B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP5210781A 1981-04-06 1981-04-06 Peeling solution for cured film of photopolymerizing composition Granted JPS57165834A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5210781A JPS57165834A (en) 1981-04-06 1981-04-06 Peeling solution for cured film of photopolymerizing composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5210781A JPS57165834A (en) 1981-04-06 1981-04-06 Peeling solution for cured film of photopolymerizing composition

Publications (2)

Publication Number Publication Date
JPS57165834A true JPS57165834A (en) 1982-10-13
JPS645695B2 JPS645695B2 (enrdf_load_stackoverflow) 1989-01-31

Family

ID=12905629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5210781A Granted JPS57165834A (en) 1981-04-06 1981-04-06 Peeling solution for cured film of photopolymerizing composition

Country Status (1)

Country Link
JP (1) JPS57165834A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6442653A (en) * 1987-08-10 1989-02-14 Tokyo Ohka Kogyo Co Ltd Peeling solution for positive type photoresist
JPS6481950A (en) * 1987-09-25 1989-03-28 Asahi Chemical Ind Agent for peeling photoresist
JPS6481949A (en) * 1987-09-25 1989-03-28 Asahi Chemical Ind Agent for peeling photoresist
JPS6488548A (en) * 1987-09-30 1989-04-03 Nagase Denshi Kagaku Kk Toner composition
JPH02131239A (ja) * 1988-11-11 1990-05-21 Nagase Denshi Kagaku Kk 水性剥離剤組成物
WO1994005766A1 (de) * 1992-09-03 1994-03-17 Circuit Chemical Products Gmbh Reinigungsmittel zum reinigen von gedruckten schaltungen und elektronischen bauteilen, verfahren zu seiner herstellung und seine verwendung
JP2010109396A (ja) * 2010-02-17 2010-05-13 Ibiden Co Ltd プリント配線板の製造方法
JP2017182049A (ja) * 2016-03-28 2017-10-05 三菱製紙株式会社 剥離方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6442653A (en) * 1987-08-10 1989-02-14 Tokyo Ohka Kogyo Co Ltd Peeling solution for positive type photoresist
JPS6481950A (en) * 1987-09-25 1989-03-28 Asahi Chemical Ind Agent for peeling photoresist
JPS6481949A (en) * 1987-09-25 1989-03-28 Asahi Chemical Ind Agent for peeling photoresist
JPS6488548A (en) * 1987-09-30 1989-04-03 Nagase Denshi Kagaku Kk Toner composition
JPH02131239A (ja) * 1988-11-11 1990-05-21 Nagase Denshi Kagaku Kk 水性剥離剤組成物
WO1994005766A1 (de) * 1992-09-03 1994-03-17 Circuit Chemical Products Gmbh Reinigungsmittel zum reinigen von gedruckten schaltungen und elektronischen bauteilen, verfahren zu seiner herstellung und seine verwendung
JP2010109396A (ja) * 2010-02-17 2010-05-13 Ibiden Co Ltd プリント配線板の製造方法
JP2017182049A (ja) * 2016-03-28 2017-10-05 三菱製紙株式会社 剥離方法

Also Published As

Publication number Publication date
JPS645695B2 (enrdf_load_stackoverflow) 1989-01-31

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