JPS57165834A - Peeling solution for cured film of photopolymerizing composition - Google Patents
Peeling solution for cured film of photopolymerizing compositionInfo
- Publication number
- JPS57165834A JPS57165834A JP5210781A JP5210781A JPS57165834A JP S57165834 A JPS57165834 A JP S57165834A JP 5210781 A JP5210781 A JP 5210781A JP 5210781 A JP5210781 A JP 5210781A JP S57165834 A JPS57165834 A JP S57165834A
- Authority
- JP
- Japan
- Prior art keywords
- soln
- peeling
- cured film
- compound
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
Abstract
PURPOSE:To prevent the clogging of a peeling device by using a soln. prepared by mixing water with a water miscible org. solvent and an amine compound as a peeling soln. for a cured film of a photopolymerizing composition. CONSTITUTION:A peeling soln. is prepared by uniformly mixing 50-95pts.wt. water with 2-40pts.wt. water miscible org. solvent such as ethylene glycol monobutyl ether and 0.5-40pts.wt. water soluble amine compound such as ethanolamine compound, polyethylene polyamine compound or alkylaminoethanol compound. By immersing a substrate in the peeling soln. or spraying the soln. on the substrate, a cured film adhered to the substrate is peeled off. The peeled pieces are made smaller than the original shape by breakibg into parts and are made round, so when the pieces are separated with a wire net or the like, they cause hardly clogging and can be separated easily.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5210781A JPS57165834A (en) | 1981-04-06 | 1981-04-06 | Peeling solution for cured film of photopolymerizing composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5210781A JPS57165834A (en) | 1981-04-06 | 1981-04-06 | Peeling solution for cured film of photopolymerizing composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57165834A true JPS57165834A (en) | 1982-10-13 |
JPS645695B2 JPS645695B2 (en) | 1989-01-31 |
Family
ID=12905629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5210781A Granted JPS57165834A (en) | 1981-04-06 | 1981-04-06 | Peeling solution for cured film of photopolymerizing composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57165834A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0219789A2 (en) * | 1985-10-22 | 1987-04-29 | Hoechst Aktiengesellschaft | Stripping solvent for photoresists |
JPS6442653A (en) * | 1987-08-10 | 1989-02-14 | Tokyo Ohka Kogyo Co Ltd | Peeling solution for positive type photoresist |
JPS6481949A (en) * | 1987-09-25 | 1989-03-28 | Asahi Chemical Ind | Agent for peeling photoresist |
JPS6481950A (en) * | 1987-09-25 | 1989-03-28 | Asahi Chemical Ind | Agent for peeling photoresist |
JPS6488548A (en) * | 1987-09-30 | 1989-04-03 | Nagase Denshi Kagaku Kk | Toner composition |
JPH02131239A (en) * | 1988-11-11 | 1990-05-21 | Nagase Denshi Kagaku Kk | Composition of peeling agent |
WO1994005766A1 (en) * | 1992-09-03 | 1994-03-17 | Circuit Chemical Products Gmbh | Agent for cleaning printed circuits and electronic components, method of producing the agent and its use |
JP2010109396A (en) * | 2010-02-17 | 2010-05-13 | Ibiden Co Ltd | Method of manufacturing printed circuit board |
JP2017182049A (en) * | 2016-03-28 | 2017-10-05 | 三菱製紙株式会社 | Detachment method |
-
1981
- 1981-04-06 JP JP5210781A patent/JPS57165834A/en active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0219789A2 (en) * | 1985-10-22 | 1987-04-29 | Hoechst Aktiengesellschaft | Stripping solvent for photoresists |
JPS6442653A (en) * | 1987-08-10 | 1989-02-14 | Tokyo Ohka Kogyo Co Ltd | Peeling solution for positive type photoresist |
JPS6481949A (en) * | 1987-09-25 | 1989-03-28 | Asahi Chemical Ind | Agent for peeling photoresist |
JPS6481950A (en) * | 1987-09-25 | 1989-03-28 | Asahi Chemical Ind | Agent for peeling photoresist |
JPS6488548A (en) * | 1987-09-30 | 1989-04-03 | Nagase Denshi Kagaku Kk | Toner composition |
JPH02131239A (en) * | 1988-11-11 | 1990-05-21 | Nagase Denshi Kagaku Kk | Composition of peeling agent |
WO1994005766A1 (en) * | 1992-09-03 | 1994-03-17 | Circuit Chemical Products Gmbh | Agent for cleaning printed circuits and electronic components, method of producing the agent and its use |
JP2010109396A (en) * | 2010-02-17 | 2010-05-13 | Ibiden Co Ltd | Method of manufacturing printed circuit board |
JP2017182049A (en) * | 2016-03-28 | 2017-10-05 | 三菱製紙株式会社 | Detachment method |
Also Published As
Publication number | Publication date |
---|---|
JPS645695B2 (en) | 1989-01-31 |
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