JPS57160113A - High speed sputtering apparatus for ferromagnetic body - Google Patents
High speed sputtering apparatus for ferromagnetic bodyInfo
- Publication number
- JPS57160113A JPS57160113A JP4413281A JP4413281A JPS57160113A JP S57160113 A JPS57160113 A JP S57160113A JP 4413281 A JP4413281 A JP 4413281A JP 4413281 A JP4413281 A JP 4413281A JP S57160113 A JPS57160113 A JP S57160113A
- Authority
- JP
- Japan
- Prior art keywords
- target
- magnetic field
- small
- ferromagnetic
- ferromagnetic bodies
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3423—Shape
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4413281A JPS57160113A (en) | 1981-03-27 | 1981-03-27 | High speed sputtering apparatus for ferromagnetic body |
CH1682/82A CH649578A5 (de) | 1981-03-27 | 1982-03-18 | Hochgeschwindigkeits-kathoden-zerstaeubungsvorrichtung. |
US06/361,629 US4401546A (en) | 1981-03-27 | 1982-03-25 | Ferromagnetic high speed sputtering apparatus |
DE19823211229 DE3211229A1 (de) | 1981-03-27 | 1982-03-26 | Vorrichtung zur ferromagnetischen schnellzerstaeubung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4413281A JPS57160113A (en) | 1981-03-27 | 1981-03-27 | High speed sputtering apparatus for ferromagnetic body |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57160113A true JPS57160113A (en) | 1982-10-02 |
JPH0243328B2 JPH0243328B2 (ja) | 1990-09-28 |
Family
ID=12683087
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4413281A Granted JPS57160113A (en) | 1981-03-27 | 1981-03-27 | High speed sputtering apparatus for ferromagnetic body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57160113A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5938385A (ja) * | 1982-08-16 | 1984-03-02 | ヴアツクテツク・システムズ・インコ−ポレ−テツド | スパツタリング装置 |
JPS6486347A (en) * | 1987-09-29 | 1989-03-31 | Toshiba Corp | Production of magneto-optical recording film |
JPH06108248A (ja) * | 1992-09-30 | 1994-04-19 | Shibaura Eng Works Co Ltd | スパッタリング源 |
-
1981
- 1981-03-27 JP JP4413281A patent/JPS57160113A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5938385A (ja) * | 1982-08-16 | 1984-03-02 | ヴアツクテツク・システムズ・インコ−ポレ−テツド | スパツタリング装置 |
JPS6486347A (en) * | 1987-09-29 | 1989-03-31 | Toshiba Corp | Production of magneto-optical recording film |
JPH06108248A (ja) * | 1992-09-30 | 1994-04-19 | Shibaura Eng Works Co Ltd | スパッタリング源 |
Also Published As
Publication number | Publication date |
---|---|
JPH0243328B2 (ja) | 1990-09-28 |
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