JPS57159042A - Semiconductor device and manufacture thereof - Google Patents
Semiconductor device and manufacture thereofInfo
- Publication number
- JPS57159042A JPS57159042A JP4316581A JP4316581A JPS57159042A JP S57159042 A JPS57159042 A JP S57159042A JP 4316581 A JP4316581 A JP 4316581A JP 4316581 A JP4316581 A JP 4316581A JP S57159042 A JPS57159042 A JP S57159042A
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- film
- case
- accumulated
- ion implantation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 5
- 239000001301 oxygen Substances 0.000 abstract 5
- 229910052760 oxygen Inorganic materials 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 3
- 238000005468 ion implantation Methods 0.000 abstract 2
- 238000005546 reactive sputtering Methods 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000001259 photo etching Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4316581A JPS57159042A (en) | 1981-03-26 | 1981-03-26 | Semiconductor device and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4316581A JPS57159042A (en) | 1981-03-26 | 1981-03-26 | Semiconductor device and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57159042A true JPS57159042A (en) | 1982-10-01 |
JPS6258544B2 JPS6258544B2 (enrdf_load_stackoverflow) | 1987-12-07 |
Family
ID=12656256
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4316581A Granted JPS57159042A (en) | 1981-03-26 | 1981-03-26 | Semiconductor device and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57159042A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60147136A (ja) * | 1984-01-11 | 1985-08-03 | Hitachi Ltd | 半導体装置用電極・配線 |
JPS61150236A (ja) * | 1984-12-24 | 1986-07-08 | Hitachi Ltd | 半導体装置 |
JP2004527715A (ja) * | 2001-06-04 | 2004-09-09 | フレニ・ブレンボ エス・ピー・エー | ブレーキピストン |
JP2020047702A (ja) * | 2018-09-18 | 2020-03-26 | キオクシア株式会社 | 半導体装置およびその製造方法 |
-
1981
- 1981-03-26 JP JP4316581A patent/JPS57159042A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60147136A (ja) * | 1984-01-11 | 1985-08-03 | Hitachi Ltd | 半導体装置用電極・配線 |
JPS61150236A (ja) * | 1984-12-24 | 1986-07-08 | Hitachi Ltd | 半導体装置 |
JP2004527715A (ja) * | 2001-06-04 | 2004-09-09 | フレニ・ブレンボ エス・ピー・エー | ブレーキピストン |
JP2020047702A (ja) * | 2018-09-18 | 2020-03-26 | キオクシア株式会社 | 半導体装置およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6258544B2 (enrdf_load_stackoverflow) | 1987-12-07 |
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