Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co LtdfiledCriticalFuji Photo Film Co Ltd
Priority to JP4072081ApriorityCriticalpatent/JPS57153732A/ja
Publication of JPS57153732ApublicationCriticalpatent/JPS57153732A/ja
B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
B01J15/00—Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor
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Chemical & Material Sciences
(AREA)
Organic Chemistry
(AREA)
Chemical Kinetics & Catalysis
(AREA)
Physical Or Chemical Processes And Apparatus
(AREA)
JP4072081A1981-03-201981-03-20Method and apparatus for multi-surface vapor deposition
PendingJPS57153732A
(en)