JPS57150843A - Negative type resist material for far ultraviolet ray and formation of resist pattern by this material - Google Patents

Negative type resist material for far ultraviolet ray and formation of resist pattern by this material

Info

Publication number
JPS57150843A
JPS57150843A JP56035227A JP3522781A JPS57150843A JP S57150843 A JPS57150843 A JP S57150843A JP 56035227 A JP56035227 A JP 56035227A JP 3522781 A JP3522781 A JP 3522781A JP S57150843 A JPS57150843 A JP S57150843A
Authority
JP
Japan
Prior art keywords
negative type
resist
resist material
far
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56035227A
Other languages
English (en)
Other versions
JPS6410058B2 (ja
Inventor
Mitsumasa Kunishi
Takaharu Kawazu
Yoshio Yamashita
Seigo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56035227A priority Critical patent/JPS57150843A/ja
Publication of JPS57150843A publication Critical patent/JPS57150843A/ja
Publication of JPS6410058B2 publication Critical patent/JPS6410058B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56035227A 1981-03-13 1981-03-13 Negative type resist material for far ultraviolet ray and formation of resist pattern by this material Granted JPS57150843A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56035227A JPS57150843A (en) 1981-03-13 1981-03-13 Negative type resist material for far ultraviolet ray and formation of resist pattern by this material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56035227A JPS57150843A (en) 1981-03-13 1981-03-13 Negative type resist material for far ultraviolet ray and formation of resist pattern by this material

Publications (2)

Publication Number Publication Date
JPS57150843A true JPS57150843A (en) 1982-09-17
JPS6410058B2 JPS6410058B2 (ja) 1989-02-21

Family

ID=12435946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56035227A Granted JPS57150843A (en) 1981-03-13 1981-03-13 Negative type resist material for far ultraviolet ray and formation of resist pattern by this material

Country Status (1)

Country Link
JP (1) JPS57150843A (ja)

Also Published As

Publication number Publication date
JPS6410058B2 (ja) 1989-02-21

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