JPS57145258A - Method of x-ray generation - Google Patents

Method of x-ray generation

Info

Publication number
JPS57145258A
JPS57145258A JP56029333A JP2933381A JPS57145258A JP S57145258 A JPS57145258 A JP S57145258A JP 56029333 A JP56029333 A JP 56029333A JP 2933381 A JP2933381 A JP 2933381A JP S57145258 A JPS57145258 A JP S57145258A
Authority
JP
Japan
Prior art keywords
ray generation
generation material
electron beam
plasma
radiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56029333A
Other languages
Japanese (ja)
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56029333A priority Critical patent/JPS57145258A/en
Publication of JPS57145258A publication Critical patent/JPS57145258A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H01J2235/082—Fluids, e.g. liquids, gases

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To generate x rays with high efficiency by simultaneously radiating electron beam from a number of cathodes toward an anode and irradiating this electron beam on an x-ray generation material. CONSTITUTION:An x-ray generation material 16 is contained in a container 15 and is heated by a heater coil 17 to be kept in liquid status. This x-ray generation material 16 is exposed from a hole 15a. Then capacitors C1-Cn are charged by means of a high voltage power supply 19 and switches SW-1-SW-n are closed simultaneously. Since an anode 18 is contained in the x-ray generation material 16, the electron beam coming from the respective cathodes 20-1- 20-n is irradiated on the x-ray generation material 16. For this reason, the x-ray generation material 16 changes into plasma instantaneously and then into a high density and temperature plasma. When this plasma is recombined, x rays are radiated by the damping radiated of electron beam.
JP56029333A 1981-03-03 1981-03-03 Method of x-ray generation Pending JPS57145258A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56029333A JPS57145258A (en) 1981-03-03 1981-03-03 Method of x-ray generation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56029333A JPS57145258A (en) 1981-03-03 1981-03-03 Method of x-ray generation

Publications (1)

Publication Number Publication Date
JPS57145258A true JPS57145258A (en) 1982-09-08

Family

ID=12273299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56029333A Pending JPS57145258A (en) 1981-03-03 1981-03-03 Method of x-ray generation

Country Status (1)

Country Link
JP (1) JPS57145258A (en)

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