JPS56114318A - Apparatus for irradiating pulse electron beam - Google Patents
Apparatus for irradiating pulse electron beamInfo
- Publication number
- JPS56114318A JPS56114318A JP1685080A JP1685080A JPS56114318A JP S56114318 A JPS56114318 A JP S56114318A JP 1685080 A JP1685080 A JP 1685080A JP 1685080 A JP1685080 A JP 1685080A JP S56114318 A JPS56114318 A JP S56114318A
- Authority
- JP
- Japan
- Prior art keywords
- negative electrode
- capacitor
- electrode
- machined
- filament
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
PURPOSE:To perform machining by connecting a table for placing a material to be machined in a low pressure gas container to the positive electrode of a capacitor, connecting the electrode having small holes over said table to the negative electrode of the capacitor, generating discharge between the upper electrode and the lower electrode by the capacitor, introducing a part of an electron stream to the lower space, and generating a pulse discharge. CONSTITUTION:A filament 14 is located over the negative electrode 15 which faces the table 17 for placing the material to be machined. The potential of the filament 14 which is a thermal electrode is negatively larger than the negative electrode 15. The capacitor 12 is charged at voltage which is a fraction of the voltage of the capacitor 11, and gives the discharge voltage of about 3KV between the filament 14 and the negative electrode 15. Part of the electron stream irradiated from the filament flows into the space under the negative electrode 15 through the small holes 18 provided in the concentric circumference of the negative electrode 15, and the electric power in the main capacitor 11 is discharged between the negative electrode and the material to be machined. In this constitution, the negative electrode 15 shields the effects of the strong electric field of the lower space, the uniform discharge can be performed to the material to be machined from the main capacitor 11 by utilizing the mechanism such as the thermal negative electrode which is readily controlled, and the energy is also readily controlled.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1685080A JPS56114318A (en) | 1980-02-14 | 1980-02-14 | Apparatus for irradiating pulse electron beam |
| US06/233,858 US4389573A (en) | 1980-02-14 | 1981-02-12 | Pulsed electron beam device comprising a cathode having through holes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1685080A JPS56114318A (en) | 1980-02-14 | 1980-02-14 | Apparatus for irradiating pulse electron beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56114318A true JPS56114318A (en) | 1981-09-08 |
Family
ID=11927682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1685080A Pending JPS56114318A (en) | 1980-02-14 | 1980-02-14 | Apparatus for irradiating pulse electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56114318A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891643A (en) * | 1981-11-26 | 1983-05-31 | Fujitsu Ltd | Annealing by electron beam |
| JPS6161395A (en) * | 1984-08-31 | 1986-03-29 | 株式会社 明石製作所 | Electron beam heater |
-
1980
- 1980-02-14 JP JP1685080A patent/JPS56114318A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891643A (en) * | 1981-11-26 | 1983-05-31 | Fujitsu Ltd | Annealing by electron beam |
| JPS6161395A (en) * | 1984-08-31 | 1986-03-29 | 株式会社 明石製作所 | Electron beam heater |
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