JPS57136320A - Exchanger for sample in electron-ray drawing device - Google Patents

Exchanger for sample in electron-ray drawing device

Info

Publication number
JPS57136320A
JPS57136320A JP56020887A JP2088781A JPS57136320A JP S57136320 A JPS57136320 A JP S57136320A JP 56020887 A JP56020887 A JP 56020887A JP 2088781 A JP2088781 A JP 2088781A JP S57136320 A JPS57136320 A JP S57136320A
Authority
JP
Japan
Prior art keywords
chamber
sample
preparatory
electron
time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56020887A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0324773B2 (enExample
Inventor
Tsutomu Ito
Toru Tojo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56020887A priority Critical patent/JPS57136320A/ja
Publication of JPS57136320A publication Critical patent/JPS57136320A/ja
Publication of JPH0324773B2 publication Critical patent/JPH0324773B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP56020887A 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device Granted JPS57136320A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56020887A JPS57136320A (en) 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56020887A JPS57136320A (en) 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device

Publications (2)

Publication Number Publication Date
JPS57136320A true JPS57136320A (en) 1982-08-23
JPH0324773B2 JPH0324773B2 (enExample) 1991-04-04

Family

ID=12039712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56020887A Granted JPS57136320A (en) 1981-02-17 1981-02-17 Exchanger for sample in electron-ray drawing device

Country Status (1)

Country Link
JP (1) JPS57136320A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5853831A (ja) * 1981-09-26 1983-03-30 Fujitsu Ltd 電子ビ−ム露光装置
JPH02250253A (ja) * 1989-03-23 1990-10-08 Nec Corp 薄膜試料用荷電粒子描画装置及び薄膜試料固定治具
JPH06244178A (ja) * 1993-11-15 1994-09-02 Hitachi Ltd Ｉｃ素子の加工装置
JPH08153721A (ja) * 1995-04-26 1996-06-11 Hitachi Ltd Ｉｃ素子の修正方法及びその装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5428371U (enExample) * 1977-07-28 1979-02-24
JPS55146930A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Specimen-exchanging device in electronic beam depicting device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5428371U (enExample) * 1977-07-28 1979-02-24
JPS55146930A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Specimen-exchanging device in electronic beam depicting device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5853831A (ja) * 1981-09-26 1983-03-30 Fujitsu Ltd 電子ビ−ム露光装置
JPH02250253A (ja) * 1989-03-23 1990-10-08 Nec Corp 薄膜試料用荷電粒子描画装置及び薄膜試料固定治具
JPH06244178A (ja) * 1993-11-15 1994-09-02 Hitachi Ltd Ｉｃ素子の加工装置
JPH08153721A (ja) * 1995-04-26 1996-06-11 Hitachi Ltd Ｉｃ素子の修正方法及びその装置

Also Published As

Publication number Publication date
JPH0324773B2 (enExample) 1991-04-04

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