JPS57135037A - Mechanism for introducing linear motion in vacuum - Google Patents

Mechanism for introducing linear motion in vacuum

Info

Publication number
JPS57135037A
JPS57135037A JP1909581A JP1909581A JPS57135037A JP S57135037 A JPS57135037 A JP S57135037A JP 1909581 A JP1909581 A JP 1909581A JP 1909581 A JP1909581 A JP 1909581A JP S57135037 A JPS57135037 A JP S57135037A
Authority
JP
Japan
Prior art keywords
magnet
vacuum
cylinder
linear motion
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1909581A
Other languages
Japanese (ja)
Inventor
Hideyuki Hirose
Masanobu Nakamura
Masatoshi Komatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1909581A priority Critical patent/JPS57135037A/en
Publication of JPS57135037A publication Critical patent/JPS57135037A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To obtain the in-vacuum linear motion introducing mechanism with high reliability inexpensively in a simple mechanism by a method wherein a magnet cylinder is arranged in a vacuum chamber and hermetically fixed by the flange part thereof. CONSTITUTION:The outer side of a magnet cylinder 20 is arranged in a chamber 21 and the flange part 20a of the magnet cylinder 20 is fixed to a chamber 21 through a seal 22. In this condition, a piston 25 having a magnet 23 provided to the outer side of the cylinder 20 and a magnet 24 provided to the inner side thereof is provided and, when the piston 25 is driven by external force, the magnet 23 in vacuum is subjected to straight motion through the magnetic force of the magnet 24. By this method, the straight motion with reliability is carried out in a simple structure without necessitating a seal in a moving part.
JP1909581A 1981-02-13 1981-02-13 Mechanism for introducing linear motion in vacuum Pending JPS57135037A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1909581A JPS57135037A (en) 1981-02-13 1981-02-13 Mechanism for introducing linear motion in vacuum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1909581A JPS57135037A (en) 1981-02-13 1981-02-13 Mechanism for introducing linear motion in vacuum

Publications (1)

Publication Number Publication Date
JPS57135037A true JPS57135037A (en) 1982-08-20

Family

ID=11989908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1909581A Pending JPS57135037A (en) 1981-02-13 1981-02-13 Mechanism for introducing linear motion in vacuum

Country Status (1)

Country Link
JP (1) JPS57135037A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60211857A (en) * 1984-03-09 1985-10-24 テーガル・コーポレーシヨン Wafer transforting device
JPS61240647A (en) * 1985-04-17 1986-10-25 Applied Material Japan Kk Manufacturing equipment for semiconductor
JPS63143579U (en) * 1987-03-12 1988-09-21
KR101156563B1 (en) 2011-03-08 2012-06-20 포항공과대학교 산학협력단 Curvature adjusting apparatus for mirror and mirror manipulating system with the same
WO2012121499A3 (en) * 2011-03-08 2012-11-08 포항공과대학교 산학협력단 Device for adjusting curvature of mirror, and mirror adjustment system comprising same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4314606Y1 (en) * 1965-01-22 1968-06-19
JPS5329392B2 (en) * 1975-10-03 1978-08-21

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4314606Y1 (en) * 1965-01-22 1968-06-19
JPS5329392B2 (en) * 1975-10-03 1978-08-21

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60211857A (en) * 1984-03-09 1985-10-24 テーガル・コーポレーシヨン Wafer transforting device
JPS61240647A (en) * 1985-04-17 1986-10-25 Applied Material Japan Kk Manufacturing equipment for semiconductor
JPS63143579U (en) * 1987-03-12 1988-09-21
KR101156563B1 (en) 2011-03-08 2012-06-20 포항공과대학교 산학협력단 Curvature adjusting apparatus for mirror and mirror manipulating system with the same
WO2012121499A3 (en) * 2011-03-08 2012-11-08 포항공과대학교 산학협력단 Device for adjusting curvature of mirror, and mirror adjustment system comprising same
US9435999B2 (en) 2011-03-08 2016-09-06 Postech Academy-Industry Foundation Device for adjusting curvature of mirror while avoiding movement of central point of mirror, and mirror adjustment system comprising same

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