JPS5713179A - Chemical etching method - Google Patents

Chemical etching method

Info

Publication number
JPS5713179A
JPS5713179A JP8756880A JP8756880A JPS5713179A JP S5713179 A JPS5713179 A JP S5713179A JP 8756880 A JP8756880 A JP 8756880A JP 8756880 A JP8756880 A JP 8756880A JP S5713179 A JPS5713179 A JP S5713179A
Authority
JP
Japan
Prior art keywords
matrix
uneven pattern
contact
etching soln
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8756880A
Other languages
Japanese (ja)
Other versions
JPS5810468B2 (en
Inventor
Hiroyuki Koike
Yukihiro Hata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TANAZAWA HAKKOSHA KK
TANAZAWA HATSUKOUSHIYA KK
Original Assignee
TANAZAWA HAKKOSHA KK
TANAZAWA HATSUKOUSHIYA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TANAZAWA HAKKOSHA KK, TANAZAWA HATSUKOUSHIYA KK filed Critical TANAZAWA HAKKOSHA KK
Priority to JP8756880A priority Critical patent/JPS5810468B2/en
Publication of JPS5713179A publication Critical patent/JPS5713179A/en
Publication of JPS5810468B2 publication Critical patent/JPS5810468B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To simply form a precise deep uneven pattern on the surface of a metallic body by forming an uneven pattern on the surface of a base material with corrosion resistance, applying an etching soln., and bringing the metallic body into contact with the base material.
CONSTITUTION: An uneven pattern 2 is formed on the outside of a cylindrical or platelike matrix 1 made of material such as PVC which is not corroded by an etching soln. A suitable etching soln. is uniformly applied to the surface of the matrix 1, and a metallic body 3 to be worked is brought into contact with the matrix 1 with a force applying means such as a spring. By rotating the matrix 1 and the body 3 while in contact with each other, the etching soln. is applied to the body 3 through the matrix 1 to etch part of the body 3 contacting with the protrusion of the matrix 1. By repeating this operation, an uneven pattern with unevenness reverse to that of the uneven pattern 2 of the matrix 1 is formed on the surface of the body 3.
COPYRIGHT: (C)1982,JPO&Japio
JP8756880A 1980-06-26 1980-06-26 chemical engraving method Expired JPS5810468B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8756880A JPS5810468B2 (en) 1980-06-26 1980-06-26 chemical engraving method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8756880A JPS5810468B2 (en) 1980-06-26 1980-06-26 chemical engraving method

Publications (2)

Publication Number Publication Date
JPS5713179A true JPS5713179A (en) 1982-01-23
JPS5810468B2 JPS5810468B2 (en) 1983-02-25

Family

ID=13918592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8756880A Expired JPS5810468B2 (en) 1980-06-26 1980-06-26 chemical engraving method

Country Status (1)

Country Link
JP (1) JPS5810468B2 (en)

Also Published As

Publication number Publication date
JPS5810468B2 (en) 1983-02-25

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