JPS57128921A - Manufacture of semiconductor element - Google Patents
Manufacture of semiconductor elementInfo
- Publication number
- JPS57128921A JPS57128921A JP1415681A JP1415681A JPS57128921A JP S57128921 A JPS57128921 A JP S57128921A JP 1415681 A JP1415681 A JP 1415681A JP 1415681 A JP1415681 A JP 1415681A JP S57128921 A JPS57128921 A JP S57128921A
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- film
- high density
- protection film
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1415681A JPS57128921A (en) | 1981-02-02 | 1981-02-02 | Manufacture of semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1415681A JPS57128921A (en) | 1981-02-02 | 1981-02-02 | Manufacture of semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57128921A true JPS57128921A (en) | 1982-08-10 |
Family
ID=11853285
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1415681A Pending JPS57128921A (en) | 1981-02-02 | 1981-02-02 | Manufacture of semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57128921A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61212057A (ja) * | 1985-02-28 | 1986-09-20 | ゼネラル・エレクトリック・カンパニイ | Ccdの製造法 |
JPH0774124A (ja) * | 1990-03-09 | 1995-03-17 | Goldstar Electron Co Ltd | イオン注入阻止方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5076992A (ja) * | 1973-11-07 | 1975-06-24 |
-
1981
- 1981-02-02 JP JP1415681A patent/JPS57128921A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5076992A (ja) * | 1973-11-07 | 1975-06-24 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61212057A (ja) * | 1985-02-28 | 1986-09-20 | ゼネラル・エレクトリック・カンパニイ | Ccdの製造法 |
JPH0774124A (ja) * | 1990-03-09 | 1995-03-17 | Goldstar Electron Co Ltd | イオン注入阻止方法 |
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