JPS57122430A - Positive type resist material with dry etching resistance - Google Patents

Positive type resist material with dry etching resistance

Info

Publication number
JPS57122430A
JPS57122430A JP826681A JP826681A JPS57122430A JP S57122430 A JPS57122430 A JP S57122430A JP 826681 A JP826681 A JP 826681A JP 826681 A JP826681 A JP 826681A JP S57122430 A JPS57122430 A JP S57122430A
Authority
JP
Japan
Prior art keywords
dry etching
methacrylic acid
methacrylate
etching resistance
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP826681A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0146863B2 (enrdf_load_stackoverflow
Inventor
Katsuyuki Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP826681A priority Critical patent/JPS57122430A/ja
Priority to US06/339,414 priority patent/US4430419A/en
Priority to GB8201246A priority patent/GB2093048B/en
Priority to CA000394565A priority patent/CA1211600A/en
Priority to NLAANVRAGE8200211,A priority patent/NL186119C/xx
Priority to FR8200936A priority patent/FR2498198B1/fr
Priority to DE19823201815 priority patent/DE3201815A1/de
Publication of JPS57122430A publication Critical patent/JPS57122430A/ja
Publication of JPH0146863B2 publication Critical patent/JPH0146863B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP826681A 1981-01-22 1981-01-22 Positive type resist material with dry etching resistance Granted JPS57122430A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP826681A JPS57122430A (en) 1981-01-22 1981-01-22 Positive type resist material with dry etching resistance
US06/339,414 US4430419A (en) 1981-01-22 1982-01-15 Positive resist and method for manufacturing a pattern thereof
GB8201246A GB2093048B (en) 1981-01-22 1982-01-18 Positive resist copolymer and method for manufacturing a pattern therewith
CA000394565A CA1211600A (en) 1981-01-22 1982-01-20 Positive resist and method for manufacturing a pattern thereof
NLAANVRAGE8200211,A NL186119C (nl) 1981-01-22 1982-01-21 Werkwijze voor het vormen van een patroon voor een positieve resist.
FR8200936A FR2498198B1 (fr) 1981-01-22 1982-01-21 Revetement resistant positif et procede pour la formation d'un dessin de ce revetement sur un substrat
DE19823201815 DE3201815A1 (de) 1981-01-22 1982-01-21 Positives resistmaterial und verfahren zur herstellung eines musters daraus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP826681A JPS57122430A (en) 1981-01-22 1981-01-22 Positive type resist material with dry etching resistance

Publications (2)

Publication Number Publication Date
JPS57122430A true JPS57122430A (en) 1982-07-30
JPH0146863B2 JPH0146863B2 (enrdf_load_stackoverflow) 1989-10-11

Family

ID=11688348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP826681A Granted JPS57122430A (en) 1981-01-22 1981-01-22 Positive type resist material with dry etching resistance

Country Status (1)

Country Link
JP (1) JPS57122430A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5868743A (ja) * 1981-10-21 1983-04-23 Hitachi Ltd 放射線感応性有機高分子材料
JPH0398051A (ja) * 1989-09-11 1991-04-23 Agency Of Ind Science & Technol 可視光記録材料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5868743A (ja) * 1981-10-21 1983-04-23 Hitachi Ltd 放射線感応性有機高分子材料
JPH0398051A (ja) * 1989-09-11 1991-04-23 Agency Of Ind Science & Technol 可視光記録材料

Also Published As

Publication number Publication date
JPH0146863B2 (enrdf_load_stackoverflow) 1989-10-11

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