JPS571215A - Sputtering device for magnetic thin-film - Google Patents

Sputtering device for magnetic thin-film

Info

Publication number
JPS571215A
JPS571215A JP7372480A JP7372480A JPS571215A JP S571215 A JPS571215 A JP S571215A JP 7372480 A JP7372480 A JP 7372480A JP 7372480 A JP7372480 A JP 7372480A JP S571215 A JPS571215 A JP S571215A
Authority
JP
Japan
Prior art keywords
film
magnetic thin
electrodes
target
sputtering device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7372480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6249974B2 (enrdf_load_stackoverflow
Inventor
Sadao Kadokura
Takashi Tomie
Kazuhiko Honjo
Shigenobu Sobajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP7372480A priority Critical patent/JPS571215A/ja
Publication of JPS571215A publication Critical patent/JPS571215A/ja
Publication of JPS6249974B2 publication Critical patent/JPS6249974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
JP7372480A 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film Granted JPS571215A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7372480A JPS571215A (en) 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7372480A JPS571215A (en) 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film

Publications (2)

Publication Number Publication Date
JPS571215A true JPS571215A (en) 1982-01-06
JPS6249974B2 JPS6249974B2 (enrdf_load_stackoverflow) 1987-10-22

Family

ID=13526455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7372480A Granted JPS571215A (en) 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film

Country Status (1)

Country Link
JP (1) JPS571215A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61232173A (ja) * 1985-04-04 1986-10-16 株式会社　島田屋本店 保存性包装もちの製造方法
EP0093838B1 (en) * 1982-02-16 1990-06-06 Teijin Limited Perpendicular magnetic recording medium and method for producing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6363379U (enrdf_load_stackoverflow) * 1986-10-15 1988-04-26

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0093838B1 (en) * 1982-02-16 1990-06-06 Teijin Limited Perpendicular magnetic recording medium and method for producing the same
JPS61232173A (ja) * 1985-04-04 1986-10-16 株式会社　島田屋本店 保存性包装もちの製造方法

Also Published As

Publication number Publication date
JPS6249974B2 (enrdf_load_stackoverflow) 1987-10-22

Similar Documents

Publication Publication Date Title
DE3787705D1 (de) Vorrichtung und Verfahren zum Auftragen von Dünnschichtüberzügen im Vacuum.
GB2018833B (en) Sputter process for manufacturing fuel cell electrodes
EP0282836A3 (en) Process and apparatus for depositing of high ohmic resistance layers by cathodic sputtering
GB2090872B (en) Magnetic arrangement on cathode target in cathode sputter apparatus
EP0242826A3 (en) Cathode for magnetron sputtering
Gurley et al. The metabolism of histone fractions: VI. Differences in the phosphorylation of histone fractions during the cell cycle
DK98484D0 (da) Apparat og fremgangsmade til magnetronkatodeforstoevning
AU536525B2 (en) Shaped electrodes for electrolysis on fuel cells
JPS6419727A (en) Dry-etching equipment employing plasma enclosure by surface magnetic field
JPS6456868A (en) Formation of large-area thin compound film and its device
GB2126775B (en) Ribbed substrate for fuel cell electrode
YU39372B (en) Device for compensating magnetic fields of neighbouring rows of cells for the electrolysis of a solution
JPS571215A (en) Sputtering device for magnetic thin-film
GB8326048D0 (en) Fuel cell electrode substrate
US4780190A (en) Sputtering cathode
Mayhew Effect of ribonuclease and neuraminidase on the electrophoretic mobility of tissue culture cells in parasynchronous growth
HRP931178B1 (en) Apparatus for reducing the magnetic perturbations in rows of high amperage electrolytic cells
JPS58189371A (ja) スパツタ装置
DE2961926D1 (en) Process for reducing the magnetic perturbations in rows of high amperage electrolytic cells
JPS577129A (en) Treating method and device for sputtering
JPS5665981A (en) Sputtering device
GB1383189A (en) Apparatus for the vacuum deposition of thin layers
JPS6473076A (en) Inline type ion sputtering device
JPS5558370A (en) Electrode for sputtering target
JPS54162691A (en) Continuously coating apparatus for carbon fiber