JPS571215A - Sputtering device for magnetic thin-film - Google Patents

Sputtering device for magnetic thin-film

Info

Publication number
JPS571215A
JPS571215A JP7372480A JP7372480A JPS571215A JP S571215 A JPS571215 A JP S571215A JP 7372480 A JP7372480 A JP 7372480A JP 7372480 A JP7372480 A JP 7372480A JP S571215 A JPS571215 A JP S571215A
Authority
JP
Japan
Prior art keywords
film
magnetic thin
electrodes
target
sputtering device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7372480A
Other languages
Japanese (ja)
Other versions
JPS6249974B2 (en
Inventor
Sadao Kadokura
Takashi Tomie
Kazuhiko Honjo
Shigenobu Sobajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP7372480A priority Critical patent/JPS571215A/en
Publication of JPS571215A publication Critical patent/JPS571215A/en
Publication of JPS6249974B2 publication Critical patent/JPS6249974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To enable the preparation of the magnetic thin-film at high speed by a method wherein one of a pair of facing target electrodes mounted into the sputtering device is formed as a magnetron type electrode consisting of a magnetic thin-film constituting element and the other as a normal type electrode being composed of a material of composition corresponding to the element. CONSTITUTION:The sputtering device is constituted by a vacuum vessel 10, an exhaust system 20 and a gas introducing system 30, and target holders 15, 16 each covered with shields 17, 18 through insulating members 13, 14 are penetrated and inserted to a pair of side plates 11, 12 of the vessel 10 and opposed. The magnetron type target electrode T1 consisting of one of elements constituting the objective magnetic thin-film is mounted to a nose of the holder 15 and the normal target electrode T2 being composed of the material of corresponding composition to a nose of the holder 16 respectively, and a ringed anode 50 is disposed in space in which these are facing each other. A substrate holding means 41 is mounted in the vicinity of these electrodes and a substrate 40 is travelled, sputtering power is supplied to the electrodes T1, T2 from power supplying means 52, 53 under this condition and formed atoms are stuck onto the substrate 40.
JP7372480A 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film Granted JPS571215A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7372480A JPS571215A (en) 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7372480A JPS571215A (en) 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film

Publications (2)

Publication Number Publication Date
JPS571215A true JPS571215A (en) 1982-01-06
JPS6249974B2 JPS6249974B2 (en) 1987-10-22

Family

ID=13526455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7372480A Granted JPS571215A (en) 1980-06-03 1980-06-03 Sputtering device for magnetic thin-film

Country Status (1)

Country Link
JP (1) JPS571215A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0093838A2 (en) * 1982-02-16 1983-11-16 Teijin Limited Perpendicular magnetic recording medium and method for producing the same
JPS61232173A (en) * 1985-04-04 1986-10-16 株式会社　島田屋本店 Manufacture of conservative packaged rice cake

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6363379U (en) * 1986-10-15 1988-04-26

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0093838A2 (en) * 1982-02-16 1983-11-16 Teijin Limited Perpendicular magnetic recording medium and method for producing the same
EP0093838B1 (en) * 1982-02-16 1990-06-06 Teijin Limited Perpendicular magnetic recording medium and method for producing the same
JPS61232173A (en) * 1985-04-04 1986-10-16 株式会社　島田屋本店 Manufacture of conservative packaged rice cake

Also Published As

Publication number Publication date
JPS6249974B2 (en) 1987-10-22

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