JPS57118237A - Positive type photosensitive composition - Google Patents

Positive type photosensitive composition

Info

Publication number
JPS57118237A
JPS57118237A JP377881A JP377881A JPS57118237A JP S57118237 A JPS57118237 A JP S57118237A JP 377881 A JP377881 A JP 377881A JP 377881 A JP377881 A JP 377881A JP S57118237 A JPS57118237 A JP S57118237A
Authority
JP
Japan
Prior art keywords
aryl
positive type
photosensitive composition
type photosensitive
aralkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP377881A
Other languages
English (en)
Other versions
JPS6358335B2 (ja
Inventor
Masabumi Uehara
Takeshi Yamamoto
Atsuo Yamazaki
Toru Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP377881A priority Critical patent/JPS57118237A/ja
Priority to US06/336,861 priority patent/US4460674A/en
Priority to DE19823201151 priority patent/DE3201151A1/de
Publication of JPS57118237A publication Critical patent/JPS57118237A/ja
Publication of JPS6358335B2 publication Critical patent/JPS6358335B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP377881A 1981-01-16 1981-01-16 Positive type photosensitive composition Granted JPS57118237A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP377881A JPS57118237A (en) 1981-01-16 1981-01-16 Positive type photosensitive composition
US06/336,861 US4460674A (en) 1981-01-16 1982-01-04 Posi-type quinone diazide photosensitive composition with sensitizer therefor
DE19823201151 DE3201151A1 (de) 1981-01-16 1982-01-15 Positive lichtempfindliche masse und diese enthaltendes positives lichtempfindliches aufzeichnungsmaterial

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP377881A JPS57118237A (en) 1981-01-16 1981-01-16 Positive type photosensitive composition

Publications (2)

Publication Number Publication Date
JPS57118237A true JPS57118237A (en) 1982-07-23
JPS6358335B2 JPS6358335B2 (ja) 1988-11-15

Family

ID=11566636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP377881A Granted JPS57118237A (en) 1981-01-16 1981-01-16 Positive type photosensitive composition

Country Status (1)

Country Link
JP (1) JPS57118237A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0436755A (ja) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd レジスト組成物
JP2005250462A (ja) * 2004-02-03 2005-09-15 Sumitomo Bakelite Co Ltd ポジ型感光性樹脂組成物、該ポジ型感光性樹脂組成物を用いた半導体装置及び表示素子、並びに半導体装置及び表示素子の製造方法
JP2006350039A (ja) * 2005-06-16 2006-12-28 Fujitsu Ltd レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240125A (en) * 1975-09-22 1977-03-28 Ibm Positive photoresist composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240125A (en) * 1975-09-22 1977-03-28 Ibm Positive photoresist composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0436755A (ja) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd レジスト組成物
JP2005250462A (ja) * 2004-02-03 2005-09-15 Sumitomo Bakelite Co Ltd ポジ型感光性樹脂組成物、該ポジ型感光性樹脂組成物を用いた半導体装置及び表示素子、並びに半導体装置及び表示素子の製造方法
JP4661245B2 (ja) * 2004-02-03 2011-03-30 住友ベークライト株式会社 ポジ型感光性樹脂組成物、該ポジ型感光性樹脂組成物を用いた半導体装置及び表示素子、並びに半導体装置及び表示素子の製造方法
JP2006350039A (ja) * 2005-06-16 2006-12-28 Fujitsu Ltd レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法
JP4588551B2 (ja) * 2005-06-16 2010-12-01 富士通株式会社 レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法

Also Published As

Publication number Publication date
JPS6358335B2 (ja) 1988-11-15

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