JPS5711338A - Film photoresist having laminate structure - Google Patents

Film photoresist having laminate structure

Info

Publication number
JPS5711338A
JPS5711338A JP8478080A JP8478080A JPS5711338A JP S5711338 A JPS5711338 A JP S5711338A JP 8478080 A JP8478080 A JP 8478080A JP 8478080 A JP8478080 A JP 8478080A JP S5711338 A JPS5711338 A JP S5711338A
Authority
JP
Japan
Prior art keywords
photoresist
polymer
film
compound
100pts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8478080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349209B2 (enrdf_load_html_response
Inventor
Mitsuru Tashiro
Yoshiyuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP8478080A priority Critical patent/JPS5711338A/ja
Publication of JPS5711338A publication Critical patent/JPS5711338A/ja
Publication of JPS6349209B2 publication Critical patent/JPS6349209B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
JP8478080A 1980-06-23 1980-06-23 Film photoresist having laminate structure Granted JPS5711338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8478080A JPS5711338A (en) 1980-06-23 1980-06-23 Film photoresist having laminate structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8478080A JPS5711338A (en) 1980-06-23 1980-06-23 Film photoresist having laminate structure

Publications (2)

Publication Number Publication Date
JPS5711338A true JPS5711338A (en) 1982-01-21
JPS6349209B2 JPS6349209B2 (enrdf_load_html_response) 1988-10-04

Family

ID=13840198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8478080A Granted JPS5711338A (en) 1980-06-23 1980-06-23 Film photoresist having laminate structure

Country Status (1)

Country Link
JP (1) JPS5711338A (enrdf_load_html_response)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187152A (ja) * 1984-09-13 1986-05-02 エム・アンド・ティ−・ケミカルズ・インコ−ポレ−テッド 回路痕跡全体にわたるスクリ−ン塗被用高分解能ソルダ−マスク感光性ポリマ−及びその生成法
US4643963A (en) * 1983-11-03 1987-02-17 Basf Aktiengesellschaft Photopolymerizable recording materials containing cyclic pentadienes for the production of printing plates, and the production of printing plates using these recording materials
JPH01221735A (ja) * 1988-02-29 1989-09-05 Nippon Synthetic Chem Ind Co Ltd:The 画像形成方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4643963A (en) * 1983-11-03 1987-02-17 Basf Aktiengesellschaft Photopolymerizable recording materials containing cyclic pentadienes for the production of printing plates, and the production of printing plates using these recording materials
JPS6187152A (ja) * 1984-09-13 1986-05-02 エム・アンド・ティ−・ケミカルズ・インコ−ポレ−テッド 回路痕跡全体にわたるスクリ−ン塗被用高分解能ソルダ−マスク感光性ポリマ−及びその生成法
JPH01221735A (ja) * 1988-02-29 1989-09-05 Nippon Synthetic Chem Ind Co Ltd:The 画像形成方法

Also Published As

Publication number Publication date
JPS6349209B2 (enrdf_load_html_response) 1988-10-04

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