JPS57110667A - Production of filament for vapor deposition - Google Patents

Production of filament for vapor deposition

Info

Publication number
JPS57110667A
JPS57110667A JP18871180A JP18871180A JPS57110667A JP S57110667 A JPS57110667 A JP S57110667A JP 18871180 A JP18871180 A JP 18871180A JP 18871180 A JP18871180 A JP 18871180A JP S57110667 A JPS57110667 A JP S57110667A
Authority
JP
Japan
Prior art keywords
shaft
vapor deposition
nozzle
die
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18871180A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0143027B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Tungsten Co Ltd
Original Assignee
Tokyo Tungsten Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Tungsten Co Ltd filed Critical Tokyo Tungsten Co Ltd
Priority to JP18871180A priority Critical patent/JPS57110667A/ja
Publication of JPS57110667A publication Critical patent/JPS57110667A/ja
Publication of JPH0143027B2 publication Critical patent/JPH0143027B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
JP18871180A 1980-12-26 1980-12-26 Production of filament for vapor deposition Granted JPS57110667A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18871180A JPS57110667A (en) 1980-12-26 1980-12-26 Production of filament for vapor deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18871180A JPS57110667A (en) 1980-12-26 1980-12-26 Production of filament for vapor deposition

Publications (2)

Publication Number Publication Date
JPS57110667A true JPS57110667A (en) 1982-07-09
JPH0143027B2 JPH0143027B2 (enrdf_load_stackoverflow) 1989-09-18

Family

ID=16228450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18871180A Granted JPS57110667A (en) 1980-12-26 1980-12-26 Production of filament for vapor deposition

Country Status (1)

Country Link
JP (1) JPS57110667A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0143027B2 (enrdf_load_stackoverflow) 1989-09-18

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