JPS57110356A - Continuous type spray painting system - Google Patents
Continuous type spray painting systemInfo
- Publication number
- JPS57110356A JPS57110356A JP55189218A JP18921880A JPS57110356A JP S57110356 A JPS57110356 A JP S57110356A JP 55189218 A JP55189218 A JP 55189218A JP 18921880 A JP18921880 A JP 18921880A JP S57110356 A JPS57110356 A JP S57110356A
- Authority
- JP
- Japan
- Prior art keywords
- paint
- solvent
- circuit
- viscosity
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
- B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
- B05B13/0421—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with rotating spray heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
- B05B14/40—Arrangements for collecting, re-using or eliminating excess spraying material for use in spray booths
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
- B05B14/40—Arrangements for collecting, re-using or eliminating excess spraying material for use in spray booths
- B05B14/41—Arrangements for collecting, re-using or eliminating excess spraying material for use in spray booths by cleaning the walls of the booth
Landscapes
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55189218A JPS57110356A (en) | 1980-12-27 | 1980-12-27 | Continuous type spray painting system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55189218A JPS57110356A (en) | 1980-12-27 | 1980-12-27 | Continuous type spray painting system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57110356A true JPS57110356A (en) | 1982-07-09 |
JPS6336831B2 JPS6336831B2 (enrdf_load_stackoverflow) | 1988-07-21 |
Family
ID=16237534
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55189218A Granted JPS57110356A (en) | 1980-12-27 | 1980-12-27 | Continuous type spray painting system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57110356A (enrdf_load_stackoverflow) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0618015A1 (de) * | 1993-03-31 | 1994-10-05 | Firma Paul Rippert | Verfahren zum Betrieb einer Spritzkabine und Spritzkabine |
US6221701B1 (en) | 1984-05-18 | 2001-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Insulated gate field effect transistor and its manufacturing method |
US6346716B1 (en) | 1982-12-23 | 2002-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material having particular oxygen concentration and semiconductor device comprising the same |
US6503771B1 (en) | 1983-08-22 | 2003-01-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor photoelectrically sensitive device |
US6664566B1 (en) | 1982-08-24 | 2003-12-16 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
USRE38727E1 (en) | 1982-08-24 | 2005-04-19 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
US7038238B1 (en) | 1985-05-07 | 2006-05-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a non-single crystalline semiconductor layer |
CN104437920A (zh) * | 2014-11-10 | 2015-03-25 | 江苏亨特宏业重工有限公司 | 小型金属无死角喷涂装置 |
CN114918059A (zh) * | 2022-07-21 | 2022-08-19 | 山东盛宝管道科技有限公司 | 一种大口径输水管道内壁防腐处理喷涂设备 |
EP4397415A1 (en) * | 2022-12-21 | 2024-07-10 | Rolls-Royce plc | System and method for wet treatment of component |
-
1980
- 1980-12-27 JP JP55189218A patent/JPS57110356A/ja active Granted
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6664566B1 (en) | 1982-08-24 | 2003-12-16 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
USRE38727E1 (en) | 1982-08-24 | 2005-04-19 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method of making the same |
US6346716B1 (en) | 1982-12-23 | 2002-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor material having particular oxygen concentration and semiconductor device comprising the same |
US6503771B1 (en) | 1983-08-22 | 2003-01-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor photoelectrically sensitive device |
US6680486B1 (en) | 1984-05-18 | 2004-01-20 | Semiconductor Energy Laboratory Co., Ltd. | Insulated gate field effect transistor and its manufacturing method |
US6660574B1 (en) | 1984-05-18 | 2003-12-09 | Semiconductor Energy Laboratory Co., Ltd. | Method of forming a semiconductor device including recombination center neutralizer |
US6734499B1 (en) | 1984-05-18 | 2004-05-11 | Semiconductor Energy Laboratory Co., Ltd. | Operation method of semiconductor devices |
US6221701B1 (en) | 1984-05-18 | 2001-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Insulated gate field effect transistor and its manufacturing method |
US7038238B1 (en) | 1985-05-07 | 2006-05-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a non-single crystalline semiconductor layer |
EP0618015A1 (de) * | 1993-03-31 | 1994-10-05 | Firma Paul Rippert | Verfahren zum Betrieb einer Spritzkabine und Spritzkabine |
CN104437920A (zh) * | 2014-11-10 | 2015-03-25 | 江苏亨特宏业重工有限公司 | 小型金属无死角喷涂装置 |
CN114918059A (zh) * | 2022-07-21 | 2022-08-19 | 山东盛宝管道科技有限公司 | 一种大口径输水管道内壁防腐处理喷涂设备 |
CN114918059B (zh) * | 2022-07-21 | 2022-09-23 | 山东盛宝管道科技有限公司 | 一种大口径输水管道内壁防腐处理喷涂设备 |
EP4397415A1 (en) * | 2022-12-21 | 2024-07-10 | Rolls-Royce plc | System and method for wet treatment of component |
Also Published As
Publication number | Publication date |
---|---|
JPS6336831B2 (enrdf_load_stackoverflow) | 1988-07-21 |
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