JPS57107025A - Heat treatment of compound semiconductor - Google Patents

Heat treatment of compound semiconductor

Info

Publication number
JPS57107025A
JPS57107025A JP55184586A JP18458680A JPS57107025A JP S57107025 A JPS57107025 A JP S57107025A JP 55184586 A JP55184586 A JP 55184586A JP 18458680 A JP18458680 A JP 18458680A JP S57107025 A JPS57107025 A JP S57107025A
Authority
JP
Japan
Prior art keywords
fusion
vessel
vapor pressure
heat treatment
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55184586A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6410091B2 (cg-RX-API-DMAC10.html
Inventor
Tsutomu Tsuji
Hideo Iwasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55184586A priority Critical patent/JPS57107025A/ja
Publication of JPS57107025A publication Critical patent/JPS57107025A/ja
Publication of JPS6410091B2 publication Critical patent/JPS6410091B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P10/00
JP55184586A 1980-12-25 1980-12-25 Heat treatment of compound semiconductor Granted JPS57107025A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55184586A JPS57107025A (en) 1980-12-25 1980-12-25 Heat treatment of compound semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55184586A JPS57107025A (en) 1980-12-25 1980-12-25 Heat treatment of compound semiconductor

Publications (2)

Publication Number Publication Date
JPS57107025A true JPS57107025A (en) 1982-07-03
JPS6410091B2 JPS6410091B2 (cg-RX-API-DMAC10.html) 1989-02-21

Family

ID=16155793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55184586A Granted JPS57107025A (en) 1980-12-25 1980-12-25 Heat treatment of compound semiconductor

Country Status (1)

Country Link
JP (1) JPS57107025A (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283020A (ja) * 1987-05-14 1988-11-18 Sanyo Electric Co Ltd 熱処理方法
KR100407955B1 (ko) * 2001-05-29 2003-12-03 엘지전자 주식회사 퓨전 기판 위에 GaAs을 형성하는 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283020A (ja) * 1987-05-14 1988-11-18 Sanyo Electric Co Ltd 熱処理方法
KR100407955B1 (ko) * 2001-05-29 2003-12-03 엘지전자 주식회사 퓨전 기판 위에 GaAs을 형성하는 방법

Also Published As

Publication number Publication date
JPS6410091B2 (cg-RX-API-DMAC10.html) 1989-02-21

Similar Documents

Publication Publication Date Title
NO813192L (no) Fremgangsmaate til kjemisk behandling av en superlegering med hoeyt wolframinnhold, samt etsemiddel til utfoerelse av fremgangsmaaten
JPS57107025A (en) Heat treatment of compound semiconductor
JPS543937A (en) High-frequency heater
JPS567436A (en) High pressure treating device
JPS5523972A (en) Preservation of vegetable
JPS5327376A (en) Forming method of high resistanc e layer
JPS54112214A (en) Production and device for high-tensile and high-modulus graphite fibers
JPS5533060A (en) Composite dry etching process
JPS559721A (en) Production of processed shiitake mushroom
JPS5650520A (en) Processing method of semiconductor substrate
JPS53105966A (en) Growth method for epitaxial layer
JPS5314563A (en) Fixing method of semiconductor pellet to lead frame
JPS53125760A (en) Manufacture for gas discharging panel
JPS57194522A (en) Thermal treatment of semiconductor wafer
Silva Jr et al. Control of Continuous Carburizing Furnace Operations With Propane
JPS5273489A (en) Carrie with double door at the bottom
JPS5530806A (en) Heat treatment method of semiconductor wafer
JPS53113477A (en) Control method of semiconductor etching treating solution
Teskeredzic Basophile punctations in erythrocytes of some sea fish poisoned by lead.
JPS5347304A (en) Maintaining method for converter out of operation for a long term
Gogishvili et al. Density of GeTe prepared by cermet method
JPS52136830A (en) Recovery of metal and metal oxide
JPS56117857A (en) Pattern formation
JPS5742122A (en) Manufacture of compound semiconductor device
JPS56141009A (en) Heat engine