JPS57104663A - Vacuum vapor deposition method - Google Patents

Vacuum vapor deposition method

Info

Publication number
JPS57104663A
JPS57104663A JP18020180A JP18020180A JPS57104663A JP S57104663 A JPS57104663 A JP S57104663A JP 18020180 A JP18020180 A JP 18020180A JP 18020180 A JP18020180 A JP 18020180A JP S57104663 A JPS57104663 A JP S57104663A
Authority
JP
Japan
Prior art keywords
granular
vapor depositing
heater
vapor
depositing material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18020180A
Other languages
Japanese (ja)
Inventor
Yoichi Osato
Teruo Misumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP18020180A priority Critical patent/JPS57104663A/en
Publication of JPS57104663A publication Critical patent/JPS57104663A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent the rise of substrate temp. and the scattering of vapor depositing material particles which are of problem in a flush vapor deposition method and make vapor deposition films of uniform composition by heating a granular heater consisting of a mixed molding of a vapor depositing material and a granular heater thereby allowing the vapor depositing material to evaporate. CONSTITUTION:Powder of a vapor depositing material (e.g.; Se-Te alloy), and a conductive material such as graphite as a granular heater material are mixed with a ball mill or the like. Thence, the mixed powders are molded by compression or sintering, whereby a molding is made. Or it is equally well to bind and mold the vapor depositing granules and the granular heater by using a binder. In general, it is preferable to keep the vapor depositing material in this molding at <=50vol%. Said molding is used as a vapor source and the granular heater is heated to allow the vapor depositing material adjacent to the granular heater to evaporate, thereby forming a vapor deposition film on a substrate. According to this method, the vapor depositing material consisting of plural components such as alloy yields the vapor depositing film with virtually no change in its composition.
JP18020180A 1980-12-18 1980-12-18 Vacuum vapor deposition method Pending JPS57104663A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18020180A JPS57104663A (en) 1980-12-18 1980-12-18 Vacuum vapor deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18020180A JPS57104663A (en) 1980-12-18 1980-12-18 Vacuum vapor deposition method

Publications (1)

Publication Number Publication Date
JPS57104663A true JPS57104663A (en) 1982-06-29

Family

ID=16079160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18020180A Pending JPS57104663A (en) 1980-12-18 1980-12-18 Vacuum vapor deposition method

Country Status (1)

Country Link
JP (1) JPS57104663A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60190201A (en) * 1984-03-09 1985-09-27 Japan Atom Energy Res Inst Evaporation material having metal dripping preventing function

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60190201A (en) * 1984-03-09 1985-09-27 Japan Atom Energy Res Inst Evaporation material having metal dripping preventing function

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