JPS60190201A - Evaporation material having metal dripping preventing function - Google Patents

Evaporation material having metal dripping preventing function

Info

Publication number
JPS60190201A
JPS60190201A JP4532584A JP4532584A JPS60190201A JP S60190201 A JPS60190201 A JP S60190201A JP 4532584 A JP4532584 A JP 4532584A JP 4532584 A JP4532584 A JP 4532584A JP S60190201 A JPS60190201 A JP S60190201A
Authority
JP
Japan
Prior art keywords
titanium
evaporation
evaporated
evaporation material
function
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4532584A
Other languages
Japanese (ja)
Inventor
Tetsuya Abe
哲也 阿部
Konosuke Inagawa
幸之助 稲川
Seiji Hiroki
成治 廣木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Atomic Energy Agency
Original Assignee
Japan Atomic Energy Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Atomic Energy Research Institute filed Critical Japan Atomic Energy Research Institute
Priority to JP4532584A priority Critical patent/JPS60190201A/en
Publication of JPS60190201A publication Critical patent/JPS60190201A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent melt dripping, in applying coating to the surface of a material by vapor deposition in order to enhance anti-wear property of said material, by using a carrier material having a m.p. higher than that of an evaporation material. CONSTITUTION:When an evaporation material is heated and the temp. thereof reaches the m.p. of titanium 1, said titanium 1 is melted to wet the surface of carbon 2 being a carrier material, and dispersed and adhered to said carbon 2 to be prevented from melt dripping to a gravity direction. As far as molten titanium 1 is present, because the evaporation material holds the same temp. as the m.p. of titanium, the carbon 2 being the carrier material holds a solid state.

Description

【発明の詳細な説明】 本発明は溶融垂れ防止機能を有する蒸発材に関する。よ
り詳細に述べると、本発明は蒸発物と担持材から成り、
加熱蒸発時に溶融状態の蒸発物が重力方向へ垂れて落下
することを防止する機能を有する蒸発材に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an evaporator having a function of preventing melt dripping. More specifically, the present invention comprises an evaporate and a support material;
The present invention relates to an evaporation material having a function of preventing molten evaporated material from hanging down in the direction of gravity during heating and evaporation.

一般に材料表面の硬質化あるいは耐摩耗性向上などのた
めに材料表面を各種物質の膜で被覆(コーティング)す
る。コーティング方法としては、コーテイング物質の特
性および被コーテイング材料の形状等により、真空蒸着
法、スパッタリング法などが用いられている。このうち
、真空蒸着法は、蒸発物(コーティング物質;すなわち
コーテイング膜の原料物質)を単に加熱・蒸発させるこ
とにより、比較的容易にコーテイング膜を形成させるこ
とができるので、最も多用されている。しかしながら、
真空蒸着法を用いてコーテイング膜を作る場合、当然な
がら、蒸発物を直接あるいは間接的に加熱し、蒸発物の
蒸気を発生させなければならない。この過程で固体状の
蒸発物は昇華性物質の場合を除き、かならず溶融状態す
なわち液状過程を通る。ところで液状になると流動性を
おびた蒸発物は自重によって重力方向へ垂れ、最終的に
自重の大きさがそ」七自身の表面張力を越えると落下す
るという現象を起こし、蒸発原料として装荷した蒸発材
の利用歩留りを著しく低下させる。
Generally, the surface of a material is coated with a film of various substances in order to harden the surface or improve wear resistance. As a coating method, a vacuum evaporation method, a sputtering method, etc. are used depending on the characteristics of the coating material and the shape of the material to be coated. Among these, the vacuum evaporation method is the most frequently used because it allows a coating film to be formed relatively easily by simply heating and evaporating the evaporated material (coating material; that is, the raw material for the coating film). however,
When making a coating film using a vacuum deposition method, it is natural that the evaporated material must be directly or indirectly heated to generate vapor of the evaporated material. In this process, solid evaporates always go through a molten state, that is, a liquid state, except in the case of sublimable substances. By the way, when the evaporated material becomes liquid, it hangs down in the direction of gravity due to its own weight, and eventually falls when the amount of its own weight exceeds its own surface tension. Significantly reduces utilization yield.

そのため従来、蒸発物の溶融垂れによる落下損失を防ぎ
蒸発原料の利用歩留りを向上させるために蒸発原料の保
持容器として坩堝を使用して蒸発を行なわせることが一
般的である。
Therefore, conventionally, in order to prevent the falling loss due to melting of the evaporated material and to improve the utilization yield of the evaporated material, it has been common to use a crucible as a holding container for the evaporated material to perform evaporation.

しかし、坩堝を使用して蒸発を行なわせる場合、 (])蒸発物の加熱のみならず、坩堝の加熱も同時に行
なうことになるので、蒸発物への加熱効率が低下し、そ
の分、コストが高くなる。
However, when evaporation is performed using a crucible, () not only the evaporated material is heated, but the crucible is also heated at the same time, so the efficiency of heating the evaporated material decreases, and the cost increases accordingly. It gets expensive.

伐)坩堝によって陰になる方向へは原理的に蒸発粒子が
飛ばないのでコーティング方向に制限を受ける。
In principle, evaporated particles do not fly in the direction shaded by the crucible, so there are restrictions on the coating direction.

(3)坩堝を使用するため蒸発部の構造が複雑になる。(3) Since a crucible is used, the structure of the evaporation section becomes complicated.

などの欠点を有する。It has the following disadvantages.

発明の要約 本発明者等は坩堝を使用することに起因する従来技術の
欠点を克服するため、坩堝を使用せずに蒸発することが
できる蒸発体を研究した。
SUMMARY OF THE INVENTION In order to overcome the drawbacks of the prior art due to the use of crucibles, the inventors have investigated evaporators that can be evaporated without the use of crucibles.

その結果、溶融状態の蒸発物の垂れ防止には、自重が常
に表面張力以下となるように溶融状態の蒸発物を、その
温度では固体であり、かつ蒸発物によって濡れる性質の
ある高融点担持拐の表面へ液状で付着・分散せしめれば
よいことを見い出した。本発明は、この知見に基づいて
なされたものである。
As a result, in order to prevent the molten evaporated material from dripping, the molten evaporated material is solid at that temperature and has the property of being wetted by the evaporated material. We have discovered that it is sufficient to attach and disperse the liquid onto the surface of the surface. The present invention has been made based on this knowledge.

従って、本発明の主目的は蒸発物とそれより融点の高い
担持材から成る蒸発材を提供することである。
Therefore, the main object of the present invention is to provide an evaporator comprising an evaporator and a support material having a higher melting point than the evaporator.

更に本発明の付随的な目的は、本発明の蒸発材を用(・
ることにより加熱蒸発時に溶融状態の蒸発物が重力方向
へ垂れて落下するのを防止する方法を提供することであ
る。
Furthermore, an incidental object of the present invention is to use the evaporator of the present invention (・
The object of the present invention is to provide a method for preventing molten evaporated material from hanging down in the direction of gravity during heating and evaporation.

本発明の別の目的および利点は以下遂次間らかにされる
、 3、発明の詳細な説明 本発明の溶融垂れ防止機能を有する蒸発材は蒸発物と、
それより高融点の担持材から成る。
Other objects and advantages of the present invention will be successively revealed below. 3. Detailed Description of the Invention The evaporative material having the function of preventing melt dripping of the present invention includes an evaporated material,
It consists of a support material with a higher melting point.

本発明で用いることのできる蒸発物は非昇華性のもの、
すなわち溶融性でかつ、担持材より、融点が低い材料で
あれば、いずれの種類でもよ(・。また、本発明で用い
られる担持材は、蒸発物より融点が高く、かつ、蒸発物
に対して濡れる性質を有するものであれば、その種類を
問わない、相持材の形状は直径0.05〜1 mmの範
囲の粒状が好ましい。蒸発物と担持材の混合体積比は担
持拐が10〜50チの範囲が好ましい。
Evaporates that can be used in the present invention include non-sublimable ones,
In other words, any type of material may be used as long as it is meltable and has a melting point lower than that of the supporting material. The shape of the supporting material is preferably granular with a diameter in the range of 0.05 to 1 mm.The mixed volume ratio of the evaporated material and the supporting material is 10 to 10 mm. A range of 50 inches is preferred.

本発明における蒸発材の加熱方法としては、電子ビーム
加熱法、直接通電加熱法、傍熱加熱法、高周波加熱法、
あるいはレーザービーム。
Examples of heating methods for the evaporation material in the present invention include electron beam heating method, direct current heating method, indirect heating method, high frequency heating method,
Or a laser beam.

アークイメージスポットの照射などのいずれかあるいは
並用でもよい。
Either one or both methods, such as arc image spot irradiation, may be used.

次に図を参照して本発明の蒸発材の一興体例を説明する
。図中、1はチタン、2は炭素である。図示する例は、
蒸発物としてチタン1、担持材として炭素2を用いるこ
とによりチタンの溶融垂れ防止機能を持たせたチタン蒸
発材の一例(断面図)である。この蒸発材が適当な加熱
方法によって加熱され、チタン1の融点である1670
℃に達するとチタン1は溶融し液状となって担持材であ
る炭素2(融点3650℃)の表面を濡らし、すなわち
分散・付着する。その結果、溶融チタン1は担持材炭素
2によって保持されることになり、チタン10重力方向
への溶融垂れが防止される。なお、溶融チタン1が存在
するかぎり蒸発材温度はチタン融点と同一温度を保持し
ているので、担持材である炭素2は固体状態を維持する
ことができる。
Next, an example of an integrated evaporation material of the present invention will be explained with reference to the drawings. In the figure, 1 is titanium and 2 is carbon. The illustrated example is
FIG. 2 is an example (cross-sectional view) of a titanium evaporator material that has a function of preventing titanium from melting and dripping by using titanium 1 as an evaporator and carbon 2 as a supporting material. This evaporative material is heated by an appropriate heating method to 1670, which is the melting point of titanium 1.
When the temperature reaches .degree. C., titanium 1 melts and becomes liquid, and wets the surface of carbon 2 (melting point: 3650.degree. C.), which is a supporting material, that is, disperses and adheres to it. As a result, the molten titanium 1 is held by the supporting material carbon 2, and the titanium 10 is prevented from dripping in the direction of gravity. Note that as long as the molten titanium 1 exists, the temperature of the evaporating material remains the same as the melting point of titanium, so the carbon 2, which is the support material, can maintain its solid state.

以下に実施例を掲げて本発明の構成および効果を具体的
に説明する。
The structure and effects of the present invention will be specifically explained below with reference to Examples.

〔実 施 例〕〔Example〕

蒸発物および担持材として、それぞれチタン金属および
粒径0.05〜0.1 mmの炭素粉末を用いて構成さ
れたチタン蒸発材を、加熱エネルギ約1kw の電子ビ
ーム加熱したときのチタン蒸発速度は蒸発材から20c
1rL離れた位置で6A秒−1であった。この蒸発速度
は同一条件下で坩堝を用いた場合のチタン蒸発速度にほ
ぼ匹敵する値である。
The titanium evaporation rate when a titanium evaporation material composed of titanium metal and carbon powder with a particle size of 0.05 to 0.1 mm as the evaporator and support material, respectively, is heated by an electron beam with a heating energy of about 1 kW is: 20c from evaporation material
It was 6 Asec-1 at a position 1 rL away. This evaporation rate is almost comparable to the titanium evaporation rate when using a crucible under the same conditions.

また、オージェ電子分光計でこのチタン蒸着膜の化学組
成を分析した結果、蒸着膜の組成はチタン100%であ
った。このことは、このチタン蒸発材からは蒸発物であ
るチタンのみが蒸発し、担持材である炭素は蒸発しない
ことを示している。
Further, as a result of analyzing the chemical composition of this vapor deposited titanium film using an Auger electron spectrometer, the composition of the vapor deposited film was found to be 100% titanium. This indicates that only titanium, which is an evaporator, is evaporated from this titanium evaporator, and carbon, which is a support material, is not evaporated.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明の溶融垂れ防止機能を有する蒸発材の一例の
断面図である。 特許出願人 日本原子力研究所 (外4名)
The figure is a cross-sectional view of an example of the evaporation material having the function of preventing melt dripping according to the present invention. Patent applicant: Japan Atomic Energy Research Institute (4 others)

Claims (5)

【特許請求の範囲】[Claims] (1)蒸発物および一種あるいは二種以上の担持椙から
主として成る溶融垂れ防止機能を有する蒸発材。
(1) An evaporation material having a function of preventing melt dripping, which is mainly composed of an evaporated material and one or more types of supporting material.
(2)担持材の融点が蒸発物より常に高いことを特徴と
する特許請求の範囲第1項記載の溶融垂れ防止機能を有
する蒸発材。
(2) The evaporative material having a function of preventing melt dripping according to claim 1, wherein the melting point of the supporting material is always higher than that of the evaporated material.
(3)蒸発物と担持材の混合体積比は担持材が10〜5
0%であることを特徴とする特許請求の範囲第1項記載
の溶融垂れ防止機能を有する蒸発材、
(3) The mixed volume ratio of evaporated matter and supporting material is 10 to 5.
The evaporation material having a function of preventing melt dripping according to claim 1, wherein the evaporation material is 0%;
(4)担持材の形状が粒状あるいは粉末であることを特
徴とする特許請求の範囲第1項記載の溶融垂れ防止機能
を有する蒸発材。
(4) The evaporation material having a function of preventing melt dripping according to claim 1, wherein the supporting material is in the form of particles or powder.
(5)蒸発材の形状が蒸発物と担持材とを一体として成
型した固状であることを特徴とする特許請求の範囲第1
項記載の溶融垂れ防止機能を有する蒸発材。
(5) Claim 1, characterized in that the shape of the evaporator is a solid formed by integrally molding the evaporator and the supporting material.
An evaporative material having a function of preventing melt dripping as described in Section 1.
JP4532584A 1984-03-09 1984-03-09 Evaporation material having metal dripping preventing function Pending JPS60190201A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4532584A JPS60190201A (en) 1984-03-09 1984-03-09 Evaporation material having metal dripping preventing function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4532584A JPS60190201A (en) 1984-03-09 1984-03-09 Evaporation material having metal dripping preventing function

Publications (1)

Publication Number Publication Date
JPS60190201A true JPS60190201A (en) 1985-09-27

Family

ID=12716156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4532584A Pending JPS60190201A (en) 1984-03-09 1984-03-09 Evaporation material having metal dripping preventing function

Country Status (1)

Country Link
JP (1) JPS60190201A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54107884A (en) * 1978-02-14 1979-08-24 Toshiba Corp Vacuum depositing method for silicon
JPS57104663A (en) * 1980-12-18 1982-06-29 Canon Inc Vacuum vapor deposition method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54107884A (en) * 1978-02-14 1979-08-24 Toshiba Corp Vacuum depositing method for silicon
JPS57104663A (en) * 1980-12-18 1982-06-29 Canon Inc Vacuum vapor deposition method

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