JPS5710138A - Manufacture of photoresist - Google Patents

Manufacture of photoresist

Info

Publication number
JPS5710138A
JPS5710138A JP8414480A JP8414480A JPS5710138A JP S5710138 A JPS5710138 A JP S5710138A JP 8414480 A JP8414480 A JP 8414480A JP 8414480 A JP8414480 A JP 8414480A JP S5710138 A JPS5710138 A JP S5710138A
Authority
JP
Japan
Prior art keywords
lamination
layer
exposure
solid surface
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8414480A
Other languages
Japanese (ja)
Inventor
Katsushige Tsukada
Toshiaki Ishimaru
Nobuyuki Hayashi
Hajime Kakumaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP8414480A priority Critical patent/JPS5710138A/en
Publication of JPS5710138A publication Critical patent/JPS5710138A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To enhance the sensitivity by laminating a film-shaped photoresist on a solid surface under reduced pressure followed by exposure and development. CONSTITUTION:The photosensitive layer 2 of a photosensitive material composed of a flexible support 1 and the layer 2 is laminated on a plane solid surface by heating and pressurization in an atmosphere under <=200mm.Hg and imagewise irradiated with active rays of light to cure the exposed part, and the unexposed part is removed by dissolution in an org. solvent or an aqueous alkali soln. to manufacture a photoresist on the solid surface. The protective film 3 is peeled off before the lamination. The atmosphere during the lamination is preferably kept under <=60mm.Hg, and the exposure is carried out within 1 day after the lamination. The layer is lamination. The layer is laminated by pressurization at 50-160 deg.C softening temp. with a vacuum sticking device. The resist image can be formed while reducing the quantity of light for exposure to 2/3 of that of a conventional method in the presence of air.
JP8414480A 1980-06-20 1980-06-20 Manufacture of photoresist Pending JPS5710138A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8414480A JPS5710138A (en) 1980-06-20 1980-06-20 Manufacture of photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8414480A JPS5710138A (en) 1980-06-20 1980-06-20 Manufacture of photoresist

Publications (1)

Publication Number Publication Date
JPS5710138A true JPS5710138A (en) 1982-01-19

Family

ID=13822296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8414480A Pending JPS5710138A (en) 1980-06-20 1980-06-20 Manufacture of photoresist

Country Status (1)

Country Link
JP (1) JPS5710138A (en)

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