JPS5698478A - Vacuum treating device - Google Patents
Vacuum treating deviceInfo
- Publication number
- JPS5698478A JPS5698478A JP30580A JP30580A JPS5698478A JP S5698478 A JPS5698478 A JP S5698478A JP 30580 A JP30580 A JP 30580A JP 30580 A JP30580 A JP 30580A JP S5698478 A JPS5698478 A JP S5698478A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- lift
- chamber
- fork
- truck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 235000012431 wafers Nutrition 0.000 abstract 12
- 238000005530 etching Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30580A JPS5698478A (en) | 1980-01-08 | 1980-01-08 | Vacuum treating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30580A JPS5698478A (en) | 1980-01-08 | 1980-01-08 | Vacuum treating device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5698478A true JPS5698478A (en) | 1981-08-07 |
JPS6247952B2 JPS6247952B2 (enrdf_load_stackoverflow) | 1987-10-12 |
Family
ID=11470181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30580A Granted JPS5698478A (en) | 1980-01-08 | 1980-01-08 | Vacuum treating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5698478A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59177367A (ja) * | 1983-03-25 | 1984-10-08 | Matsushita Electric Ind Co Ltd | 試料搬送機構を有する真空蒸着装置 |
JPS6010625A (ja) * | 1983-06-29 | 1985-01-19 | Tokyo Denshi Kagaku Kabushiki | 多段プラズマ処理装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6440047U (enrdf_load_stackoverflow) * | 1987-09-07 | 1989-03-09 |
-
1980
- 1980-01-08 JP JP30580A patent/JPS5698478A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59177367A (ja) * | 1983-03-25 | 1984-10-08 | Matsushita Electric Ind Co Ltd | 試料搬送機構を有する真空蒸着装置 |
JPS6010625A (ja) * | 1983-06-29 | 1985-01-19 | Tokyo Denshi Kagaku Kabushiki | 多段プラズマ処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6247952B2 (enrdf_load_stackoverflow) | 1987-10-12 |
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