JPS5681922A - Manufacture of thin film - Google Patents

Manufacture of thin film

Info

Publication number
JPS5681922A
JPS5681922A JP15893279A JP15893279A JPS5681922A JP S5681922 A JPS5681922 A JP S5681922A JP 15893279 A JP15893279 A JP 15893279A JP 15893279 A JP15893279 A JP 15893279A JP S5681922 A JPS5681922 A JP S5681922A
Authority
JP
Japan
Prior art keywords
thin film
substrate
spacer
manufacture
crack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15893279A
Other languages
English (en)
Inventor
Hajime Ichiyanagi
Nobuhiko Fujita
Hiroshi Kawai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP15893279A priority Critical patent/JPS5681922A/ja
Publication of JPS5681922A publication Critical patent/JPS5681922A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP15893279A 1979-12-06 1979-12-06 Manufacture of thin film Pending JPS5681922A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15893279A JPS5681922A (en) 1979-12-06 1979-12-06 Manufacture of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15893279A JPS5681922A (en) 1979-12-06 1979-12-06 Manufacture of thin film

Publications (1)

Publication Number Publication Date
JPS5681922A true JPS5681922A (en) 1981-07-04

Family

ID=15682483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15893279A Pending JPS5681922A (en) 1979-12-06 1979-12-06 Manufacture of thin film

Country Status (1)

Country Link
JP (1) JPS5681922A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5972722A (ja) * 1982-09-16 1984-04-24 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド 非均質膜のデポジシヨンを防止する基板シ−ルド
JPS5981077U (ja) * 1982-11-24 1984-05-31 旭化成株式会社 薄膜形成用基板収納ラツク構造

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531465A (en) * 1976-06-25 1978-01-09 Matsushita Electric Ind Co Ltd Manufacturer for semiconductor mono crystal thin film and its manufacturing unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531465A (en) * 1976-06-25 1978-01-09 Matsushita Electric Ind Co Ltd Manufacturer for semiconductor mono crystal thin film and its manufacturing unit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5972722A (ja) * 1982-09-16 1984-04-24 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド 非均質膜のデポジシヨンを防止する基板シ−ルド
JPH0576171B2 (ja) * 1982-09-16 1993-10-22 Energy Conversion Devices Inc
JPS5981077U (ja) * 1982-11-24 1984-05-31 旭化成株式会社 薄膜形成用基板収納ラツク構造

Similar Documents

Publication Publication Date Title
JPS5749579A (en) Thermal printer head
JPS5417033A (en) Fixing roller for zerography
JPS5681922A (en) Manufacture of thin film
IT1089022B (it) Procedimento e dispositivo per rivestire substrati di vetro o ceramica,in modo continuo,mediante spruzzamento catodico
JPS5365276A (en) Rotary chemical evaporation apparatus for forming thin film
JPS5216224A (en) Photographic light sensitive material
JPS53120527A (en) Forming method of positive type radiation sensitive material layer
USD924326S1 (en) Teaching aid
JPS5384712A (en) Photographic material
JPS539895A (en) Copolymers film useful on surface coating and process for producing same
JPS5210747A (en) Electro-chromic display unit
JPS5290902A (en) Production of reproducing stylus
JPS51121092A (en) Heat-curable composite sheet material
JPS5285082A (en) Film thickness controlling in thin film formation
JPS526380A (en) Abrasion resistant thin film
JPS5225880A (en) Surface-hardened transparent plastic article
JPS52140274A (en) Pressure-reduction vapor growth method
JPS5347773A (en) Peering method for unnecessarily formed layer
JPS51123139A (en) Photographic materials
JPS5352036A (en) Delay line of elastic-surface-wave-difussion type
JPS6442576A (en) Composite sputtering target
JPS527750A (en) Photoelectric cell
JPS5339983A (en) Manufacture of thin film
JPS548684A (en) Facing material
JPS522598A (en) Manufacturing method of card and the card