JPS5285082A - Film thickness controlling in thin film formation - Google Patents
Film thickness controlling in thin film formationInfo
- Publication number
- JPS5285082A JPS5285082A JP114076A JP114076A JPS5285082A JP S5285082 A JPS5285082 A JP S5285082A JP 114076 A JP114076 A JP 114076A JP 114076 A JP114076 A JP 114076A JP S5285082 A JPS5285082 A JP S5285082A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- thickness controlling
- film thickness
- film formation
- formation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To control film thickness in transferring an article to be treated above an evaporation source and forming a thin film on it, by detecting thickness of the thin film with a light projector-receiver.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP114076A JPS5285082A (en) | 1976-01-08 | 1976-01-08 | Film thickness controlling in thin film formation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP114076A JPS5285082A (en) | 1976-01-08 | 1976-01-08 | Film thickness controlling in thin film formation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5285082A true JPS5285082A (en) | 1977-07-15 |
JPS5745305B2 JPS5745305B2 (en) | 1982-09-27 |
Family
ID=11493131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP114076A Granted JPS5285082A (en) | 1976-01-08 | 1976-01-08 | Film thickness controlling in thin film formation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5285082A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0254404U (en) * | 1988-10-13 | 1990-04-19 |
-
1976
- 1976-01-08 JP JP114076A patent/JPS5285082A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5745305B2 (en) | 1982-09-27 |
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