JPS5681159A - Rotary coating apparatus - Google Patents
Rotary coating apparatusInfo
- Publication number
- JPS5681159A JPS5681159A JP15891779A JP15891779A JPS5681159A JP S5681159 A JPS5681159 A JP S5681159A JP 15891779 A JP15891779 A JP 15891779A JP 15891779 A JP15891779 A JP 15891779A JP S5681159 A JPS5681159 A JP S5681159A
- Authority
- JP
- Japan
- Prior art keywords
- rising
- rotation numbers
- turn table
- rotation
- imparted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To enhance the quality and the production yield by providing a mechanism for controlling the rising property of rotation numbers when rotation is initiated to eliminate complicated operations in conventional methods corresponding to a kind of a base plate.
CONSTITUTION: The set rotation numbers of the rotary coating apparatus are set a reference rotation numbers and, in order to providing the mechanism for controlling a rising gradient of the rotation numbers to a reference gradient to a shaft part of a turn table 1 to which the base plate to be treated is set, a power generating element 2, a time measuring instrument 3, an A-D converter 4, a digital comparator 5, a reference digital input apparatus 6 and a D-A converter 7 are arranged. By above described constitution, when the rising of the rotation numbers of the turn table 1 is gentle, positive voltage is imparted to a motor for driving the turn table 1 and, when steep, negative voltage is imparted thereto to correct the rising curve thereof to a reference rising curve. This apparatus is effective in forming a photoresist coating on a semiconductor substrate.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15891779A JPS5927230B2 (en) | 1979-12-07 | 1979-12-07 | Rotary coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15891779A JPS5927230B2 (en) | 1979-12-07 | 1979-12-07 | Rotary coating device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5681159A true JPS5681159A (en) | 1981-07-02 |
JPS5927230B2 JPS5927230B2 (en) | 1984-07-04 |
Family
ID=15682160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15891779A Expired JPS5927230B2 (en) | 1979-12-07 | 1979-12-07 | Rotary coating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5927230B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599919A (en) * | 1982-07-08 | 1984-01-19 | M Setetsuku Kk | Applying method for photo-resist |
JPS5918633A (en) * | 1982-07-22 | 1984-01-31 | Toshiba Corp | Resist applying apparatus |
-
1979
- 1979-12-07 JP JP15891779A patent/JPS5927230B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599919A (en) * | 1982-07-08 | 1984-01-19 | M Setetsuku Kk | Applying method for photo-resist |
JPS5918633A (en) * | 1982-07-22 | 1984-01-31 | Toshiba Corp | Resist applying apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5927230B2 (en) | 1984-07-04 |
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